Block copolymer (BCP) nanolithography provides an economical way to pattern nanoscale features for the semiconductor industry. Molecular cyclization can reduce feature sizes, but like linear BCPs, cyclic BCP nanostructure size is limited by the order-disorder transition (ODT). Although the ODTs of pure linear and cyclic BCPs have been studied extensively, there is little information on binary blends of these BCPs. Here, we use dissipative particle dynamic simulations to study the impact of size mismatch and molecular architecture of component BCPs on the ODT for various blends. We see that the blend ODT always occurs at higher segregation strength than one would predict from linear interpolation between pure-component ODTs. The deviation from this simple prediction is greater for blends with greater size mismatch between components. We find clustering of like components (i.e., linear BCPs with linear BCPs and cyclic BCPs with cyclic BCPs) in the disordered phase, and the characteristic lengths of the component clusters correlate with molecular size. Because the ordered state consists of uniformly spaced lamellae, which requires interdigitation of linear and cyclic components of the blend, resolution of the size mismatch between clusters seen in the disordered state can be thought of as a barrier to ordering. Published by the American Physical Society 2024
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