Background/Objectives: In recent years, the research on molybdenum disulphide (MoS2) has gained significance because of its unique properties and ease of incorporation in hybrid structures, which makes it one of the most suitable materials for devices and multifaceted Applications. The objective of the study is to synthesize MoS2 nanofilms and then to characterize them through X-ray diffraction (XRD) technique. Methods: In this study, MoS2 nanofilms are synthesized on silicon dioxide substrates by the thermal Chemical Vapour Deposition (CVD) technique, where molybdenum trioxide (MoO3) (VI) powder and sulphur (S) flakes are used as precursors. Findings:X-ray diffraction (XRD) measurements have been carried out for the thermal CVD grown MoS2 nanofilm samples. Further, the observed XRD data has been analyzed and the structural analysis of synthesized MoS2 nanofilms is presented in this report. Furthermore, the experimentally observed findings are compared with the standard findings and shown that they are resembling closely. Novelty/Applications: In order to highlight the scope of our work, the important applications, of the molybdenum disulphide nanostructures are also discussed, that make MoS2 nanostructures attractive candidates in fields as diverse as energy, environmental, biomedical and semiconductors. Keywords: Chemical vapour deposition; molybdenum disulphide; nanofilms;XRD; transition metal dichalcogenide