The formation of titanium dibordie on a heated substrate by chemical vapor deposition was studied using BCl 3, TiCl 4 and H 2 as reactants. In order to determine the optimum temperature and related factors, the deposition rates were measured thermogravimetrically. The deposition was observed at temperatures above 800°C, and the deposition rate increased rapidly with temperature. When graphite was used as substrate, the amount of deposit increased in a linear fashion with time. This indicated that the growth rate was constant. At high BCl 3 partial pressures, high deposition rates were observed, but the layers obtained under these atmospheres were porous and poorly adherent. On the other hand, under high TiCl 4 partial pressure conditions, the resulting deposits were dense and showed preferred orientation. When using low carbon steel as a substrate in place of graphite, the growth rate was not constant, and the coating layer obtained was poor in adhesiveness. To obtaining adhesive titanium diboride coatings, a preliminary electroplating of cobalt or nickel on steel was found to be effective.
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