A transition probability for defect-related Auger excitation (DRAE) of rare-earth ion inserted into amorphous matrix is calculated. The result is applied to excitation of an erbium ion in amorphous silicon occurring via capture of an electron by the dangling bond (D) defect. We have demonstrated high efficiency of the DRAE process which ensures photo- and electroluminescence of erbium ions in amorphous silicon matrix. It is shown that the temperature quenching of erbium luminescence in amorphous silicon is controlled by competition of the DRAE and the multiphonon nonradiative transitions.
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