Multilayer Mirrors Research Articles

High thermal stability of the reflectivity of Be/Al multilayer mirrors designed for extreme ultraviolet wavelength

Superior optical contrast due to the combination of beryllium and aluminum in periodic Be/Al multilayers is the reason for effective reflectivity of these mirrors at extreme ultraviolet wavelength i.e. 17 nm. Depending on the thickness of the layers and annealing temperature, microstructure of beryllium and aluminum layers in periodic multilayers was investigated by Raman scattering spectroscopy and X-ray diffraction. Thinner film of beryllium showed more ordered structure which is qualitatively determined by narrow linewidth of optical phonon. The nucleation and grain growth of beryllium and aluminum is observed at higher annealing temperature. However, the effect of annealing on the modification of microstructure of beryllium and aluminum at lower temperature 373 K is not observed. This is the reason for almost similar value of reflectivity of ∼ 55 % for as-deposited and thermally annealed mirror at 373 K. At higher annealing temperature, the complete loss of reflectivity is observed, associated with the destruction of periodic modulation of mirrors due to interdiffusion, nucleation and grain growth of beryllium and aluminum.

Study of the temporal stability of the reflection coefficient in the vicinity of 58.4 nm of narrow-band Sc/Al mirrors with Si or ScNx interlayers and a MoSi2 protective cap layer

Observation of a sample of Si/Al/Sc mirror with a MoSi2 protective cap layer, which was stored in air for 40 months, showed that the peak reflectivity at a wavelength of 58.4 nm during this period decreased from 32 % to 20.5 %, and over the last 20 months of observation—from 21.5 % to 20.5 %, which indicates a significant decrease in the rate of decline and almost stabilization of the peak reflectivity at the level of 20 %. The spectral reflection peak width of this mirror at half maximum has not changed over the past 20 months and amounted to 6.3 nm. The given data of secondary ion mass spectrometry and grazing incidence X-ray reflectometry show that the decrease in reflectance of Si/Al/Sc multilayer mirrors with a MoSi2 protective cap layer is mainly due to an increase in the amount of impurities (oxygen and carbon) in the structure and on the surface of the mirrors and, to a lesser extent, due to the broadening of the interlayer boundaries. Comparison of the rate of decrease in reflectance at 58.4 nm of Sc/Al mirrors with interlayers of silicon and nitride scandium and a MoSi2 cap layer indicates that neither the material and thickness of the interlayer nor the thickness of the protective MoSi2 cap layer within 3–6 nm have a significant effect on this rate.

Highly reflective Mo/Be/Si multilayer mirrors with zero stress values for 13.5 nm wavelength

This study investigates mechanical stresses in Mo/Be/Si multilayer mirrors. We determined layer thicknesses (for Si∼1.0 nm, Mo∼2.8 nm and Be∼3.2 nm) in the period that simultaneously provided high reflection coefficients (R∼66–67%) at a wavelength of 13.5 nm with zero internal stress values. At the wavelength of 13.5 nm, the reflection coefficient of a stressless Mo/Be/Si multilayer mirror deposited on a micro-electro-mechanical system of micromirrors had a value of about 23% with a reflection from the witness of 67%. An interferometric method for determining the stress values in films, which is able to provide a measurement accuracy at the level of Δs ∼ ±0.24 MPa, is described in detail.

Inverse design of distributed bragg reflector targeting a sharp reflectivity spectrum

Distributed Bragg reflectors (DBRs) have found applications in various fields, including optical communications, light generation, solar cells, and sensors. DBRs are also crucial in open-access Fabry‐Pérot microcavities for enhanced and spectrally tunable light-matter interactions. This document presents the inverse design, fabrication, and optical characterization of aperiodic Ta2O5/SiO2 multilayer DBR mirrors targeting a sharp reflectivity spectrum. The results were confirmed through simulations and experimental measurements. The proposed inverse design methodology can be used to develop DBRs for important technologies such as single-photon sources, polaritonic systems, and random laser generation.

Solar-pumped fiber laser using a solid-state luminescent solar collector.

We have developed a fully planar solar-pumped fiber laser using a solid-state luminescent solar collector (LSC). This laser does not use any focusing device, such as a lens or mirror; thus, it can lase without tracking the sun. Our developed device with an aperture of 30 cm emits 15 mW, corresponding to an optical-to-optical conversion efficiency of 0.023% and a collection efficiency of 0.21 W/m2. A 12-fold improvement over a previously developed liquid LSC is achieved by combining the total internal reflection of the solid-state LSC with dielectric multilayer mirrors. The observed laser power is in good agreement with that predicted via numerical simulation, demonstrating the effectiveness of our proposed method.

Development of High‐Reflectivity and Antireflection Dielectric Multilayer Mirrors for AlGaN‐Based Ultraviolet‐B Laser Diodes and their Device Applications

Fabrication techniques for high‐reflectivity (HR) and antireflection (AR) dielectric multilayer mirrors for AlGaN‐based ultraviolet‐B (UV‐B) laser diodes are developed. After depositing several dielectric materials and evaluating their complex refractive indices via ellipsometry, it is determined that SiO2 as a low‐refractive‐index material and Ta2O5 as a high‐refractive‐index material are appropriate material combinations in the UV‐B region at a light wavelength of ≈300 nm due to their low extinction coefficients and large refractive index difference. Based on these results, HR mirror with a reflectance of >99% in the UV‐B region at a center wavelength of 310 nm and an AR mirror with a reflectance of ≈8% in the same wavelength range are demonstrated; a mirror with reflectance that is almost equal to the designed value is demonstrated. Furthermore, these mirrors are coated on the respective edge surfaces of the UV‐B laser diodes. A comparison of the characteristics of the same device before and after edge coating reveals a reduction in the threshold current density of laser oscillation, whereas, simultaneously, an increase in slope efficiency and external differential quantum efficiency is observed. The improvement of these device characteristics, estimated from the above reflectance values, is confirmed to be almost theoretically explainable.

Raman scattering studies of Si/B4C periodic multilayer mirrors with an operating wavelength of 13.5 nm

In order to obtain mirrors with a minimum value of residual stress, periodic multilayer mirrors composed of Si/B4C were deposited by magnetron sputtering with change in pressure of sputtering Ar gas. The microstructure and phase of Si and B4C was manipulated by the pressure of Ar gas which overall affected the stress in the mirrors. The minimum stress was obtained at higher pressure of sputter Ar gas, which showed the formation of amorphous boron, amorphous B4C, free carbon atoms and amorphous carbon structure in the B4C layers, investigated by Raman scattering spectroscopy. In Raman spectroscopy, a transverse optical (TO) mode of amorphous Si was shifted to lower frequency with increase in Ar gas pressure, which indicated relaxation of stress, also confirmed by the curvature measurement of mirrors. However, in the case of high residual stress, the amorphous B4C was a prominent phase in this layer and the frequency of the TO mode of amorphous Si was blue-shifted. Microstructure and stress affected the interfaces and modulation of the periodicity of the Si/B4C mirrors, investigated by secondary ion mass spectroscopy, which influenced the reflectivity of the mirrors.

Tamm Plasmon Resonance as Optical Fingerprint of Silver/Bacteria Interaction.

The incorporation of responsive elements into photonic crystals is an effective strategy for fabricating active optical components to be used as sensors, actuators, and modulators. In particular, the combination of simple multilayered dielectric mirrors with optically responsive plasmonic materials has proven to be successful. Recently, Tamm plasmon (TP) modes have emerged as powerful tools for these purposes. These modes arise at the interface between a distributed Bragg reflector (DBR) and a plasmonic layer and can be excited at a normal incidence angle. Although the TP field is located usually at the DBR/metal interface, recent studies have demonstrated that nanoscale corrugation of the metal layer permits access to the TP mode from outside, thus opening exciting perspectives for many real-life applications. In this study, we show that the TP resonance obtained by capping a DBR with a nanostructured layer of silver is responsive to Escherichia coli. Our data indicate that the modification of the TP mode originates from the well-known capability of silver to interact with bacteria, within a process in which the release of Ag+ ions leaves an excess of negative charge in the metal lattice. Finally, we exploited this effect to devise a case study in which we optically differentiated between the presence of proliferative and nonproliferative bacteria using the TP resonance as a read-out. These findings make these devices promising all-optical probes for bacterial metabolic activity, including their response to external stressors.

Sub-second pair distribution function using a broad bandwidth monochromator.

Here the use of a broad energy bandwidth monochromator, i.e. a pair of B4C/W multilayer mirrors (MLMs), is demonstrated for X-ray total scattering (TS) measurements and pair distribution function (PDF) analysis. Data are collected both on powder samples and from metal oxo clusters in aqueous solution at various concentrations. A comparison between the MLM PDFs and those obtained using a standard Si(111) double-crystal monochromator shows that the measurements yield MLM PDFs of high quality which are suitable for structure refinement. Moreover, the effects of time resolution and concentration on the quality of the resulting PDFs of the metal oxo clusters are investigated. PDFs of heptamolybdate clusters and tungsten α-Keggin clusters from X-ray TS data were obtained with a time resolution down to 3 ms and still showed a similar level of Fourier ripples to PDFs obtained from 1 s measurements. This type of measurement could thus open up faster time-resolved TS and PDF studies.

Determination of refractive indices of materials in modeling multilayer mirrors

Thin-film coatings for optical elements are widely used in various industries. Antireflection coatings are used in display screens, photodetectors, fiber optic light guides, mirror coatings are used for telescopes, medical equipment, etc. One of the main goals in the production of thin-film coatings is to determine the refractive index and the choice of materials applied to optical products. We present the results of determining the refractive indices of materials used for the manufacture of multilayer mirrors with the desired spectral characteristics. In general, light reflection occurs at the interface between two materials, for example, glass and air. Dielectric films were obtained by high-frequency ion-beam sputtering of the target. It is shown that the refractive index of the SiO2 film must be repeatedly corrected to minimize systematic errors. The results obtained can be used in the production of high-precision optical systems for various industries, especially medicine, space instrumentation, aviation and others.

Microstructural stability of silicon and beryllium nanofilms in periodic Si/Be multilayer mirrors investigated by Raman scattering spectroscopy

Microstructural stability of silicon and beryllium nanofilms in periodic Si/Be multilayer mirrors investigated by Raman scattering spectroscopy

Patterned dielectric mirrors for uniformly high reflection in polarized light

Two types of multilayered dielectric mirrors with high reflection in the visible range are fabricated on line-patterned substrates using a suitable combination of cost-effective soft lithography and RF magnetron sputtering. They are characterized at different visible wavelengths lying outside and inside their stopband range. Their response to linearly polarized incident light depends on the wavelength, angle of incidence, and the direction of orientation of the patterned lines on the substrate with respect to the direction of polarization. A comparison of these broadband high reflectors on patterned substrates with that of equivalent high reflectors on planar substrates confirmed that the patterned high reflectors have a much higher uniformity in their reflectance value when the polarization direction of incident light is changed, both within and outside their stopband range, even at oblique angles of incidence. These broadband high reflectors are useful in applications that require uniformly high reflection even while there are changes in wavelength, polarization and the angle of incidence.

High-irradiance illumination system for transmission extreme ultraviolet microscopy

A high-irradiance illumination system with normal-incidence multilayer mirrors is developed. The system consists of two concave Mo/Si multilayer mirrors with aspherical substrates that provide critical illumination by imaging a laser-produced plasma (LPP) light source at a wavelength of 13.6 nm with a magnification of almost unity. By effectively correcting spherical aberration, a raytracing computation indicates that the irradiance on the sample can be increased by about four times compared to that for a conventional system with spherical mirrors. We experimentally confirmed the enhancement by combining a LPP light source with aspherical mirrors fabricated by magneto rheological finishing.

Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B4C incorporation

The optical contrast and minimum layer thickness of Ni/Ti broadband neutron multilayer supermirrors is usually hampered by an interface width, typically 0.7 nm, caused by nanocrystallites, interdiffusion, and/or intermixing. We explore the elimination of nanocrystallites in combination with interface smoothening by modulation of ion assistance during magnetron sputter deposition of 0.8 to 6.4 nm thick Ni and Ti layers. The amorphization is achieved through incorporation of natural B4C where B and C preferably bond to Ti. A two-stage substrate bias was applied to each layer; -30 V for the initial 1 nm followed by -100 V for the remaining part, generating multilayer mirrors with interface widths of 0.40-0.45 nm. The results predict that high performance supermirrors with m-values as high as 10 are feasible by using 11B isotope-enriched B4C combined with temporal control of the ion assistance.

High-speed and wide-field nanoscale table-top ptychographic EUV imaging and beam characterization with a sCMOS detector.

We present high-speed and wide-field EUV ptychography at 13.5 nm wavelength using a table-top high-order harmonic source. Compared to previous measurements, the total measurement time is significantly reduced by up to a factor of five by employing a scientific complementary metal oxide semiconductor (sCMOS) detector that is combined with an optimized multilayer mirror configuration. The fast frame rate of the sCMOS detector enables wide-field imaging with a field of view of 100 µm × 100 µm with an imaging speed of 4.6 Mpix/h. Furthermore, fast EUV wavefront characterization is employed using a combination of the sCMOS detector with orthogonal probe relaxation.

An Efficient Method for the Experimental Characterization of Periodic Multilayer Mirrors: A Global Optimization Approach

This study proposes a new approach to periodic multilayer mirrors (PMMs) characterizations based on measured X-ray reflectivity (XRR) data. Here, XRR data are used to reconstruct the internal structure of PMMs using grazing incidence X-ray reflectivity (GIXR). A mathematical model of electromagnetic wave reflection by PMMs is employed to implement forward prediction, which will then be used iteratively in a global optimization framework in order to reconstruct the PMM unknown structure parameters. A typical simulation of PMM often includes tens to thousands of unknown structure parameters, rendering standard curve fitting methods cumbersome and impractical. To make the PMM characterization method computationally feasible, this study combines implementation of the Levy flight particle swarm optimization (LFPSO) algorithm with a parallelized version of the electromagnetic solver X-Ray Calc in order to simplify the model parameter reconstruction process. Levy flight, a random walk wherein the Levy distribution is used to determine step size, is a more efficient search strategy for global optimization because of the long jumps made by the particles. It is demonstrated that a PMM model with up to thousands of structure parameters can be reconstructed within several seconds on a regular workstation. The algorithm is tested with both measured and theoretical XRR data using in-house fabricated PMMs with known structures. Excellent agreement with the actual structures is observed, which is attained in short computation time. The new approach avoids manual curve fitting and simplified GIXR analysis and is observed to scale linearly with the size of the PMM structure, making it attractive for X-ray optics systems involving large-and-complex reflecting mirrors.

Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography

Ptychography is a lensless imaging technique that is aberration-free and capable of imaging both the amplitude and the phase of radiation reflected or transmitted from an object using iterative algorithms. Working with extreme ultraviolet (EUV) light, ptychography can provide better resolution than conventional optical microscopy and deeper penetration than scanning electron microscope. As a compact lab-scale EUV light sources, high harmonic generation meets the high coherence requirement of ptychography and gives more flexibilities in both budget and experimental time compared to synchrotrons. The ability to measure phase makes reflection-mode ptychography a good choice for characterising both the surface topography and the internal structural changes in EUV multilayer mirrors. This paper describes the use of reflection-mode ptychography with a lab-scale high harmonic generation based EUV light source to perform quantitative measurement of the amplitude and phase reflection from EUV multilayer mirrors with engineered substrate defects. Using EUV light at 29.6nm from a tabletop high harmonic generation light source, a lateral resolution down to ∼88nm and a phase resolution of 0.08rad (equivalent to topographic height variation of 0.27nm) are achieved. The effect of surface distortion and roughness on EUV reflectivity is compared to topographic properties of the mirror defects measured using both atomic force microscopy and scanning transmission electron microscopy. Modelling of reflection properties from multilayer mirrors is used to predict the potential of a combination of on-resonance, actinic ptychographic imaging at 13.5nm and atomic force microscopy for characterising the changes in multilayered structures.

Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask.

The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control the period thickness distribution. To investigate the effect of shadow mask on the microstructure of Mo/Si multilayers, we deposited a set of Mo/Si multilayers with and without the shadow mask on a curved substrate with aperture of 200 mm by direct current (DC) magnetron sputtering in this work. Grazing incidence X-ray reflectivity (GIXR), diffuse scattering, atomic force microscope (AFM) and X-ray diffraction (XRD) were used to characterize the multilayer structure and the EUV reflectivity were measured at the National Synchrotron Radiation Laboratory (NSRL) in China. By comparing the results, we found that the layer microstructure including interface width, surface roughness, layer crystallization and the reflectivity were barely affected by the mask and a high accuracy of the layer thickness gradient can be achieved.

Influence of the multilayer dielectric mirror design on the laser damage growth in the sub-picosecond regime.

The peak power of high-power laser facilities is limited by the laser-induced damage to the final optical components. Also, when a damage site is generated, the damage growth phenomenon limits the lifetime of the component. Many studies have been performed to improve the laser-induced damage threshold of these components. The question now arises as to whether improvement of the initiation threshold leads to a reduction of the damage growth phenomenon. To address this question, we performed damage growth experiments on three different multilayer dielectric mirror designs exhibiting different damage thresholds. We used classical quarter-wave designs and optimized designs. The experiments were carried out with a spatial top-hat beam, spectrally centered at 1053nm with a pulse duration of 0.8ps in s- and p-polarization. The results showed the impact of design on the improvement of the damage growth thresholds and a reduction of the damage growth rates. A numerical model was used to simulate damage growth sequences. The results reveal similar trends to those observed experimentally. On the basis of these three cases, we have shown that improvement of the initiation threshold through a modification of the mirror design can lead to the reduction of the damage growth phenomenon.

Increasing soft x-ray reflectance of short-period W/Si multilayers using B4C diffusion barriers

Short-period multilayer mirrors are used in wavelength-dispersive x-ray fluorescence to extend the wavelength range available with naturally occurring Bragg-crystals. W/Si multilayer mirrors with a period of 2.5 nm are used to reflect and disperse elements in the O-Kα–Al-Kα range. However, the reflectance is far from theoretical due to nanoscale W-Si intermixing and formation of WSix. In this work, B4C diffusion barriers were applied in sputter deposited 2.5 nm W/Si multilayers to inhibit W–Si interaction. A peak reflectance of 45% at 9.7° grazing was measured at a wavelength of 0.834 nm—the highest reported in the literature so far. Diffuse scattering measurements revealed no change in interfacial roughness when applying B4C barriers compared to W/Si. A hybrid grazing incidence x-ray reflectivity and x-ray standing wave fluorescence analysis revealed an increase in W concentration of the absorber layer after the application of B4C barriers. Chemical analysis suggests a partial replacement of W silicide bonds with W carbide/boride bonds from the B4C barrier. The formed WxBy and WxCy instead of WxSiy is hypothesized to increase reflectance at 0.834 nm due to its higher W atomic density.