The next generation of extremely large telescopes (ELTs) that will be built on a scale of 30–50 meters in diameter necessarily require an increased ability to correct wavefront errors. Currently, wavefront correction is achieved through the use of a deformable mirror (DM). The degree and amount of correction depends on amechanical displacement of segments of themirror (stroke), and the number of actuators in the mirror surface (order). An effective ELTwill require a high-stroke (10microns) and high-order (100X100 actuators) mirror, a costly prospect using current technology.1 Lowering the cost while improving the performance of DMs is possible using microelectromechanical systems (MEMS) technology. However, current surface machining processes used to fabricate MEMS deformable mirrors, such as the Sandia ultra-planar multilevel MEMS technology (SUMMiT) and MEMSCAP’s PolyMUMPS process, limit a DM’s stroke due to the use of thin-film sacrificial layers (which are dissolved away after the etching process to free up micromechanical components in the actuators).2, 3 Commercially available surface micromachined MEMS mirrors are limited in stroke to approximately 5.5 microns, about half of the stroke required by ELTs. A high aspect ratio fabrication process capable of depositing thick layers will allow the DM’s to provide both high-stroke and highorder corrections, thus bypassing the need for a complex dual woofer (high stroke, low order)/tweeter (high order, low stroke) DM configuration.4 In our work, we tested different actuator designs with a bonded faceplate constructed using the LIGA (German acronym for lithography, electroplating, and molding) process, enabling multilayer fabrication of MEMS devices.5 Various types of high-stroke gold actuators consisting of folded springs with Figure 1. Diagram showing the final release of the monolithic fabricated structure created using our technique. The gap for the Xbeam electrostatic actuators is 20 microns, enabling a mirror stroke of 10 microns. WMS-15: specific glass-ceramic substrate. Not to scale.