In this paper, we investigate multiatomic steps naturally formed on patterned vicinal GaAs substrates during metal organic vapor phase epitaxial (MOVPE) growth. The substrates are (0 0 1)GaAs misoriented by 2.0° and 5.0° toward [−1 1 0] direction. Periodic trenches are formed on the substrate with periods of 0.4–4.0 μm along the [1 1 0] direction using electron beam lithography and wet etching techniques. Periodic multiatomic step structures are clearly observed on AlGaAs/GaAs grown surfaces which are almost equal to the periods of the underlying substrate patterns. From cross-sectional scanning electron microscope (SEM) images, the growth modes are observed. As the growth proceeds, the growth modes change and can be divided into three regions; the multiatomic step formation, transition and multiatomic step dissociation regions. The multiatomic step features also depend on the pattern periods. GaAs grown layer thicknesses at the edges of the multiatomic steps are thicker than those on the terraces, and this effect is prominent for shorter periodicity patterns. GaAs/AlGaAs quantum wells are grown on patterned vicinal substrates with a 0.4 μm period. The cathodoluminescence (CL) spectrum at 7.0 K has two emission peaks. From the surface and cross-sectional CL images, the lower energy peak corresponds to the quantum well formed at the edges of the multiatomic steps and the higher energy peak corresponds to that on the terrace, consistent with the results of cross-sectional SEM observations. Using optimized patterning and growth condition, we can fabricate highly uniform quantum wire (QWR) arrays at the step edges.
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