The mechanisms involved in the (photo)dissolution of silicon in fluoride solutions are discussed. Several methods, including intensity modulated photocurrent spectroscopy, in situ ir spectroscopy, rotating ring disc voltammetry and ellipsometry, have been used to examine the anodic dissolution process. The valence state of the dissolving silicon has been determined under different conditions, and the optical properties of the surface have also been characterized. The generation of hydrogen has been linked in the case of n-Si to intensity dependent photocurrent multiplication, and in the case of p-Si it has been related to different etching regimes. The current oscillations observed during the anodic dissolution of p-Si are also discussed.
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