We developed specific negative tone resists suitable for preparing periodic inorganicnanostructures by ArF photolithography. This approach is based on the sol–gel chemistryof modified metal alkoxides followed by DUV laser irradiation. Patterning at the nanoscalewas demonstrated by using an achromatic interferometer operating at 193 nm. In a secondstep, thermal treatment could be used to obtain metal oxide nanostructures (ZrO2,TiO2). Such thermal treatment did not affect the integrity of the nanostructures. TheDUV-induced modifications of the physico-chemical properties of the sol–gel thin filmwere followed by ellipsometry, XPS and AFM. The crystalline structure of thematerial after thermal treatment was proved by DRX analysis. Examples of periodicnanostructures are given in order to illustrate the possibilities opened by thisnew route that provides a convenient method to create transparent, robust, highrefractive index nanostructures compatible with a wide variety of substrates.