Mixed-source Hydride Vapor Phase Epitaxy Research Articles

Growth of hexagonal-shape Si on a 4H–SiC substrate by mixed-source hydride vapor phase epitaxy

Growth of hexagonal-shape Si on a 4H–SiC substrate by mixed-source hydride vapor phase epitaxy

Electrical properties of 2H-Si microwire grown by mixed-source hydride vapor phase epitaxy

Hexagonal 2H polytypes of Si (2H-Si) exhibit promising mechanical and optical properties owing to their crystal structures with quasi-direct bandgap characteristics. However, few studies have investigated the electrical properties of 2H-Si semiconductors. In this study, we used a hot-probe measurement to determine the doping type of 2H-Si microwires (MWs) prepared by hydride vapor-phase epitaxy (HVPE). It was found that the 2H-Si MWs had unintentional n-type characteristics. For the first time, a heterojunction PN diode with n-type 2H-Si MW and p-type Si (100) was fabricated. According to the current–voltage and capacitance–voltage measurements, the n-type doping concentration of the unintentionally doped 2H-Si MWs was 4.3–9.5 × 1015 cm−3 and the electron mobility was 260–580 cm2/V·s.

Insights into the growth of hexagonal Si crystals using Al-based nano absorber

Although hexagonal (2H) silicon (Si) semiconductors exhibit excellent optical properties owing to their quasi-direct bandgap, their growth conditions, which require extremely high pressures, preclude their widespread use in industrial applications. The current study, therefore, proposes a novel approach for the facile growth of hexagonal Si at atmospheric pressure via a unique phenomenon known as Al-based nano absorber. A mixed-source hydride vapor phase epitaxy (HVPE) method was used for the growth of the hexagonal Si single crystals employing a rapid interaction between GaCl3, AlCl, and SiCln gases at a high temperature of 1200 °C using a source mixture of Ga, Al, and Si. In this process, the Al-based nano absorber was formed, which resulted in the absorbance of Si atoms, rather than the growth of Al-based nano absorber, to form the Si crystals due to the subsequent lack of GaCl3 and AlCl sources. The hexagonal Si structure of these Si crystals was confirmed using field emission scanning electron microscopy, high-resolution x-ray diffraction spectroscopy, and Raman spectroscopy. Thus, the current study establishes atmospheric pressure mixed-source HVPE as a facile approach for growing various allotropic crystals such as Si, C, or Ge via absorption of other atoms by an Al-based nano absorber.

Optical property of hexagonal (2H) silicon crystal

Hexagonal (2H) silicon (Si) semiconductors have excellent mechanical properties and optically diverse applications due to their structure and quasi-direct bandgap. The 2H-Si has a relatively lower direct band gap of approximately 1.69 eV at the Γ-point in comparison with that of diamond-silicon (i.e. 3.4 eV), but it is not actually a direct bandgap semiconductor. Herein, we report an optical property of wide spectrum light emission in visible and infrared ranges from grown Si crystals with a 2H structure of a 0 = 0.3824 nm, c 0 = 0.6257 nm, and c 0/a 0 = 1.6362 corresponding to theoretical predictions and experimental results. Obtained via high-resolution transmission electron microscopy measurements, the crystal structure of the grown 2H Si possesses the only stable form of the 2H structure with the characteristic quasi-direct bandgap, achieved using mixed-source hydride vapor phase epitaxy at about 1200 °C. Raman, photoluminescence, and electroluminescence spectra, Commission International de l’ Eclairage chromaticity coordinates of light emission, lattice parameters, and the quality of the crystals were evaluated and found to correspond with the predicted results. The reported material has potential applications in optoelectronics.

Growth of a Thick AlN Epilayer by Using the Mixed-Source Hydride Vapor Phase Epitaxy Method

A thick AlN epilayer with an approximately 1.25-mm thickness was grown on a sapphire substrate by using a mixed source (Al+Ga of very small amount) at around 1150 °C for 2 hours and a mixed-source hydride vapor phase epitaxy (HVPE) method in a simplified reactor interlinked in series with no separation between the source and the growth zones. The simplified reactor was designed to minimize the reaction between quartz and AlCl vapor species of a high partial pressure at around 1150 °C. Thegrowthofthe thickAlN epilayerseemed to be due to theveryhighgrowthrate (maximum value of 600 µm/h) resulting from the minimization of the response distance between the vapor species and the source gases caused by interlinking in series the edge of the source zone with the substrate in the growth zone. The characteristics of the grown thick AlN epilayer were investigated by using cross-sectional scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS), Raman spectrometry and X-ray diffraction (XRD).

Characterization of Epilayers in Vertical Light-Emitting Diode Grown by Mixed-Source Hydride Vapor Phase Epitaxy

Characterization of Epilayers in Vertical Light-Emitting Diode Grown by Mixed-Source Hydride Vapor Phase Epitaxy

Comparison of AIN Nanowire-Like Structures Grown by using Mixed-Source Hydride Vapor Phase Epitaxy Method

Four AlN nanowire-like structures were simultaneously grown directly without a buffer layer on four substrates-sapphire, quartz, Si(111), and 6H-SiC-via a mixed-source hydride vapor phase epitaxy (HVPE) method using a mixed source (Al+Ga) containing a small quantity of Ga at 1150 °C for 2 h. Deposition was carried out using a simplified reactor designed in series without any separation between the source and the growth zones. AlN nanostructures with hexagonal crystal structures were grown successfully and directly on thin, pre-grown AlN nucleation areas on the quartz substrates. Furthermore, AlN nanostructures were grown on the sapphire substrate without a buffer layer and on pre-grown epilayers on the Si (111) and the 6H-SiC substrates, respectively. The characteristics of the AlN nanowire-like structures grown on the four substrates were investigated using energy-dispersive X-ray spectrometry and field-emission scanning electron microscopy.

Growth of AlN Epilayers on Sapphire Substrates by Using the Mixed-Source Hydride Vapor Phase Epitaxy Method

AIN epilayers of different thicknesses were grown directly on sapphire substrates without a buffer layer by using a mixed (Al+Ga) source containing 95 at% Al and a mixed-source hydride vapor phase epitaxy (HVPE) method at a temperature of around 1120°C. The grown epilayers consisted of an AlN alloy in the upper region and an AlGaN alloy in the nucleation region just above the sapphire substrate. The upper part of the epilayer gradually transformed from AlGaN into AlN owing to a decrease in the Ga content of the AlGaN alloy grown on the sapphire substrate with increasing growth thickness. The role of Ga in the mixed (Al+Ga) source in the growth of the epilayer directly on the sapphire substrate and the dependence of the growth mechanism of the epilayer with varying Ga contents on the growth thickness were investigated. We found that Ga in the mixed (Al+Ga) source only acted as an activation material that generated gaseous precursors rather than directly contributing to the growth of the epilayers. The mixed-source HVPE method appears suitable for the growth of thick AIN epilayers.

Fabrication of selective-area growth InGaN LED by mixed-source hydride vapor-phase epitaxy

We prepared InGaN light-emitting diodes (LEDs) with the active layers grown from a mixed source of Ga–In–N materials on an n-type GaN substrate by a selective-area growth method and three fabrication steps: photolithography, epitaxial layer growth, and metallization. The preparation followed a previously developed experimental process using apparatus for mixed-source hydride vapor-phase epitaxy (HVPE), which consisted of a multi-graphite boat, for insulating against the high temperature and to control the growth rate of epilayers, filled with the mixed source on the inside and a radio-frequency (RF) heating coil for heating to a high temperature (T > 900 °C) and for easy control of temperature outside the source zone. Two types of LEDs were prepared, with In compositions of 11.0 and 6.0% in the InGaN active layer, and room-temperature electroluminescence measurements exhibited a main peak corresponding to the In composition at either 420 or 390 nm. The consecutive growth of InGaN LEDs by the mixed-source HVPE method provides a technique for the production of LEDs with a wide range of In compositions in the active layer.

AlN and AlGaN layers grown on Si(111) substrate by mixed-source hydride vapor phase epitaxy method

High Al-composition AlGaN and AlN epilayers were grown directly on Si(111) substrate by a hydride vapor phase epitaxy (HVPE) method with a melted mixed source in a graphite boat set in a source zone with high temperatures of T = 700 and 800 °C, respectively. The presence of the Ga material in the mixed source of Ga and Al promoted the growth of AlN and AlGaN epilayers in the growth zone. When the temperature in the source zone was 800 °C, the crystalline quality of the AlN and AlGaN epilayers increased as the ratio of Ga to Al increased, and the optimum mix ratio of Ga to Al for the growth of AlN epilayers was approximately 0.35–0.42, obtained from a numerical fitting analysis of the X-ray diffraction (XRD) data for these epilayers. It appears that they can be grown directly by our melted-mixed-source HVPE method in a high-temperature source zone.

Mechanism of light emission and manufacturing process of vertical-type light-emitting diode grown by hydride vapor phase epitaxy

We developed a vertical-type light-emitting diode (LED) in which the substrate is removed using a hydride vapor phase epitaxy (HVPE) apparatus consisting of a multi-graphite boat filled with a mixed source and a high-temperature (T ≈ 900 °C) RF heating coil outside the source zone. The new chip-growth process with a significant reduction in the number of production steps is completed in only four steps, namely, photolithography, epitaxial layer growth, sorting, and metallization. We analyze the emission mechanism of these lights from measurement results to validate the characteristics of the light emitted from these vertical-type blue LEDs and white LEDs (WLEDs) without substrates, and propose that this mixed-source HVPE method may be a promising production technique for LEDs.

Carbon microspheres grown by using hydride vapor phase epitaxy

A carbon microsphere of a core-shell type was grown by using a new method of mixed-source hydride vapor phase epitaxy (HVPE). The surface and the cross section of the carbon microsphere grown by using the new method were observed by using scanning electron microscopy (SEM). The characteristics of the carbon microsphere were investigated by using X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HR-TEM). From these measurements, the diameters of the carbon spheres were about a few hundred micrometers. Furthermore, we showed that carbon microspheres of the core-shell type could be grown successfully by using a mixed-source HVPE method and that they had larger sizes than those grown by using existing methods. This mixed-source HVPE method is proposed as a new method for making carbon microspheres.

HVPE 방법에 의해 성장된 탄소 마이크로구의 특성

The carbon microspheres of a core-shell type were grown by the method of mixed-source hydride vapor phase epitaxy (HVPE). The surface and the cross section of the carbon microsphere grown by a new method were observed by scanning electron microscope (SEM). The characteristics of the carbon microsphere were investigated by X-ray photoelectron spectroscopy (XPS) and a high resolution-transmission electron microscope (HR-TEM). From these measurements, the diameters of carbon sphere were about few hundred micrometers. Furthermore, we show that the carbon microsphere of the core-shell type by mixed-source HVPE method can be grown successfully with the larger size than those of the existing one. This mixed-source HVPE method is proposed a new method for making of carbon microsphere.

Ultraviolet Light Emitting Diode with High Quality Epilayer Grown by Hydride Vapor Phase Epitaxy

In this paper, the selective area growth (SAG) of SAG-UV light-emitting diode (LED) was performed by mixed-source hydride vapor phase epitaxy (HVPE) with a multi-sliding boat system. The SAG-UV LED consists of a Si-doped GaN layer, an Si-doped AlGaN cladding layer, an AlGaN active layer, an Zn-doped AlGaN cladding layer, and a Zn-doped GaN capping layer. All of the epitaxial layers of LED structure were grown consecutively with a multi-sliding boat system. Room-temperature electroluminescence (EL) characteristics show an emission peak wavelength of 330 nm at room temperature. The aging test result of SAG-UV LED shows that the current was changed from 27.7 to 31.2 mA during 170 h at room temperature. At the current–voltage (I–V) measurement, the turn-on voltage of the SAG-UV LED is 3.5 V at room temperature. The value of the series resistance is about 200 Ω. We find that the mixed-source HVPE method with multi-sliding boat system is possible to be one of the growth methods of ultra-violet LEDs with high quality epi-layer.

Nonphosphor White Light Emitting Diodes by Mixed-Source Hydride Vapor Phase Epitaxy

In this paper, we approached a novel fabrication for non phosphor white light emitting diodes (LEDs) by the growth of AlGaN/InAlGaN double-hetero structures using by mixed-source hydride vapor phase epitaxy (HVPE) system with multi-sliding boat. It is unique crystal growth technology different from conventional HVPE and metal organic chemical vapor deposition (MOCVD) system using mixed metal source of aluminum, indium and gallium. The characterization of non phosphor white LEDs was examined by photoluminescence (PL) and electroluminescence (EL). The results of EL were found green and yellow emissions as spectrum peaks near 500, 550, and 610 nm definitely. The CIE chromaticity coordinates of white LEDs was measured at injection current 30 mA. Our results are nearly positions; at x = 0.28 and y = 0.31. Even though the LED needs more improved in optical properties, we demonstrated achieving phosphor-free solid-state white lighting.

Nonphosphor White Light Emitting Diodes by Mixed-Source Hydride Vapor Phase Epitaxy

In this paper, we approached a novel fabrication for non phosphor white light emitting diodes (LEDs) by the growth of AlGaN/InAlGaN double-hetero structures using by mixed-source hydride vapor phase epitaxy (HVPE) system with multi-sliding boat. It is unique crystal growth technology different from conventional HVPE and metal organic chemical vapor deposition (MOCVD) system using mixed metal source of aluminum, indium and gallium. The characterization of non phosphor white LEDs was examined by photoluminescence (PL) and electroluminescence (EL). The results of EL were found green and yellow emissions as spectrum peaks near 500, 550, and 610 nm definitely. The CIE chromaticity coordinates of white LEDs was measured at injection current 30 mA. Our results are nearly positions; at x = 0.28 and y = 0.31. Even though the LED needs more improved in optical properties, we demonstrated achieving phosphor-free solid-state white lighting.

Addition of Sb as a Surfactant for the Growth of Nonpolar a-plane GaN by Using Mixed-source Hydride Vapor Phase Epitaxy

Addition of Sb as a Surfactant for the Growth of Nonpolar a-plane GaN by Using Mixed-source Hydride Vapor Phase Epitaxy

Structural Change of InGaN Nanostructures Grown by Mixed-Source Hydride Vapor Phase Epitaxy

We determined the effect of the type of substrate on the growth of InGaN nanostructures by mixed-source hydride vapor phase epitaxy (HVPE). InGaN nanostructures were formed on c-plane, r-plane sapphire, and undoped GaN substrates at various growth temperatures. Also, we looked into the changes in the structural and optical characteristics of InGaN nanostructures when antimony (Sb) is used as a surfactant during the growth of InGaN nanostructures. The samples were characterized by scanning electron microscopy (SEM) and photoluminescence (PL) measurement. The density of the nanostructures on the surface and the indium composition of the InGaN layer varied depending on the type of substrate and growth temperature. The aligning direction of the nanostructures markedly changed and the indium composition increased when Sb was used as the surfactant during the growth of the InGaN nanostructure, compared with the results of the InGaN nanostructures grown without Sb addition.

혼합소스 HVPE 방법에 의한 InGaN 나노구조의 성장에 있어서 Sb 첨가의 영향

본 논문에서는 Sb를 촉매제로 이용하는 경우의 InGaN 나노구조의 성장과 구조적 특징 및 광학적 특성에 대해서 연구하였다. 결정성장에 있어서 촉매제의 사용은 성장 모드의 변화와 결정 결함의 감소 등을 위한 목적으로 많이 사용되어왔다. 본 연구에서는 혼합소스 HVPE(hydride vapor phase epitaxy) 사용하여 (0001) 사파이어 기판 위에 InGaN 나노구조를 성장하였고, 구조적 및 광학적 특성은 scanning electron microscope(SEM)과 photoluminescence(PL)를 통해 평가하였다. Sb이 첨가되지 않은 경우에는 InGaN 나노구조가 c-축 방향으로 정렬되는 경향을 보이지만 Sb이 첨가된 경우에는 InGaN 나노구조의 c-축 방향이 기판에 대해 평행하거나 경사진 방향으로 정렬되고 있는 것을 관찰할 수 있었다. In의 조성은 Sb 의 첨가 여부에 관계없이 약 3.2% 정도로 계산되었다. 이러한 결과들로부터 측면 배향된 나노입자를 활성층으로 하는 광소자에 적용할 경우 압전 전계를 완화할 수 있기 때문에 광소자의 발광 성능을 향상시킬 수 있을 것으로 기대된다. We report on the growth and characteristics of the structural and optical properties of InGaN nano-structures doped with antimony (Sb) as a catalyst. The use of catalyst has been explored to modify the growth and defect generation during strained layer heteroepitaxial growth. We performed the growth of the InGaN nano-structures on c-sapphire substrates using mixed-source hydride vapor phase epitaxy (HVPE). The characteristic of samples was measured by scanning electron microscope (SEM) and photoluminescence (PL). The aligning direction of c-axis of the InGaN nano-structures was changed from vertical to parallel or inclined to the surface of substrates when the Sb was added as a catalyst. The indium composition was estimated about 3.2% in both cases of with or without the addition of Sb in the InxGal-xN structures. From the results of InGaN nano-structures formed with the addition of Sb, we can expect the performance of optical devices would be more improved by reduced piezo-electric field if we use the InGaN nano-structures of which c-axes are aligned parallel to the substrates as an active layer.

Characteristics of a Non-Phosphor White LED Grown by Using Mixed-Source HVPE

The growth of an AlGaN-based non-phosphor white light emitting diode (LED) on a templated n-GaN (0001) sapphire substrate is performed by using mixed-source hydride vapor phase epitaxy (HVPE) with a multi-sliding boat. The DH (doublehetero) structure is grown by using a selective area growth (SAG) method. The non-phosphor white LED structure consists of a Te-doped AlGaN cladding layer, an AlGaN active layer, a Mg-doped AlGaN cladding layer and a Mg-doped GaN capping layer. The gas ow rates of HCl and NH3 are maintained at 20 sccm and 800 sccm, respectively. The growth temperatures of the source zone and the growth zone are 900 C and 1090 C, respectively. The electroluminescence (EL) main peak of the AlGaN-based white LED is observed at 400 nm and minor peaks are emitted in a broad spectrum from 450 nm to 600 nm. A combination of blue and broadband yellow peaks creates a white light. The non-phosphor white LED has a measured color rendering index (CRI) from 76 to 87. These results show mixed-source HVPE with a multi-sliding boat can be used to fabricate a non-phosphor white LED. Additionally, optical module measurements and X-ray di raction (XRD) veri ed the optical and the crystal quality of the white LED.