Mist Deposition Method Research Articles

Ultrahigh Transparent Safety Film for Spectrally Selective Photo/Electrothermal Conversion via Surface-Enhanced Plasma Resonance Dynamics.

Traditional deicing methods are increasingly insufficient for modern technologies like 5G infrastructure, photovoltaic systems, nearspace aerocraft, and terrestrial observatories. To address the challenge of combining anti-icing efficiency with operational performance, an innovative, spectrally selective, photo/electrothermic, ice-phobic film was prepared through a cost-effective mist deposition method. By manipulating the diameter ratio and density of nanowires, the local density of free electrons within this film is controlled to precisely dictate the position and intensity of surface plasmon resonance to achieve spectrally selective photo/electrothermal conversion. Additionally, the synthesized hydrophobic N-Boroxine-PDMS/SiO2 layer improves thermal stability and accelerates the deicing process. It achieves rapid deicing within 86 s under photothermal conditions and 65 s with Joule heating while maintaining high optical transmittance. The film improves the operational efficiency and thermal safety of equipment while preserving aesthetics and stability, thereby underscoring its broad suitability for advanced outdoor installations in cold environments.

ミストデポジション法を用いて調製した質量イオン化支援剤の物性評価と植物性自然毒の可視化の検討

Herein, physical evaluation of a mass ionization assist agent prepared using mist deposition method and the visualization of natural occurring poisons in plants were investigated. An -cyano-4-hydroxy-cinnamic acid (CHCA) crystal layers were formed on sliced botanical samples deposited on a glass slide for a mass ionization assist agent of matrix assisted laser desorption/ionization(MALDI) imaging. The formed CHCA crystal layer exhibits a homogeneous surface at nozzle temperatures over 200 ℃, and its chemical stability is confirmed via Raman spectroscopy. -chaconine and -solanine in sample were detected as H+ adduct localized around of root in sliced potato sample using MALDI-fourier transform ion cyclotron resonance mass spectrometry and mass spectrometry imaging. Mist deposition method is effective for the mass ionization assist preparation and promising for utilize to visualization of target components in samples.

One-Step Coating of Full-Coverage CsPbBr3 Thin Films via Mist Deposition for All-Inorganic Perovskite Solar Cells

In this work, one-step coating of CsPbBr3 thin films using the mist deposition method is demonstrated. The CsPbBr3 layer is composed of large grains with an average size of approximately 1.4 μm, an...

Facile catalyst deposition using mists for fluidized-bed production of sub-millimeter-long carbon nanotubes

We developed a facile mist deposition method that yields nanometer-thick catalyst films on ceramic beads using aqueous solution of metal nitrates as a low cost catalyst precursor through two different strategies: (a) using a monolayer of a mixture of Fe(NO3)3 and Al(NO3)3 (Fe + Al) and (b) using a bilayer of Fe(NO3)3 on top of the mixture of Fe(NO3)3 and Al(NO3)3 (Fe/(Fe + Al)). In the fluidized bed, the catalyst precursor films were converted into Fe nanoparticles on an AlOx layer by thermal annealing and CNTs were synthesized by chemical vapor deposition. The yield and specific surface area of the resulting CNTs were strongly influenced by the deposition methods. The bilayer deposition strategy showed an improved controllability in acquiring small catalyst particles at a high density, which obtained high yields of CNTs with large specific surface area. As a result, CNTs of 7.5 nm in diameter, triple-wall on average, and 0.6 mm in length were synthesized by employing the fluidized bed chemical vaper deposition technique, suggesting a new way for the high-yield production of long few-wall CNTs at reasonable cost.

Fabrication of CsPbBr3 Thick Films by Using a Mist Deposition Method for Highly Sensitive X-ray Detection

AbstractX-ray imaging is a valuable technique used for medical imaging and non-destructive inspection of industrial products. However, the radiation may put humans at risk of developing cancer. Consequently, highly sensitive X-ray detectors, which enable X-ray imaging at a low dose rate, are required. Metal halide perovskite materials have demonstrated excellent X-ray detection performance including a high sensitivity owing to their high absorption coefficient, high carrier mobility, and long carrier lifetime. However, perovskite thick films with a large area, which is essential to realize the application of such materials to X-ray imaging devices have not been extensively investigated. To this end, in this study, a polymer is employed as a buffer layer to avoid film exfoliation, which makes it difficult to fabricate perovskite thick films, and a 110-μm-thick CsPbBr3 film is successfully obtained using a scalable solution method. In addition, an X-ray detector based on the CsPbBr3 thick film is fabricated, which demonstrates a sensitivity of 11,840 μC Gyair–1 cm–2. This sensitivity is approximately 600 times higher than that of the existing commercial a-Se X-ray detectors.

Fabrication of (101)-oriented CsPbBr3 thick films with high carrier mobility using a mist deposition method

CsPbBr3 is a promising candidate for highly sensitive flat-panel X-ray detectors due to its excellent optoelectronic properties. Thus, a method of preparing thick CsPbBr3 films (>10 μm) over large areas (>10 × 10 cm2) is required. Herein, we report the fabrication of thick CsPbBr3 films using a scalable mist deposition method. In this method, the film thickness was controlled and up-scaled by the number of deposition cycles. The obtained CsPbBr3 films were composed of highly (101)-oriented columnar crystals and had a high carrier mobility of 13 cm2 V−1 s−1, which is comparable to that for single crystals.

Formation of textured microstructure by mist deposition of TiO2 nanoparticles

Unique and various textured TiO2 films have been easily fabricated by mist deposition method on silicon and glass substrates with mild preparation conditions. Two kinds of TiO2 nanoparticle with different shape, size, and crystal form were used as starting material, which resulted in a simple prepara- tion process under low temperature and ordinary pressure. It was easy to control the thickness, morphology, and roughness of textured TiO2 film by adjusting the mist deposition conditions such as deposition time, temperature, and the shape and size of nanoparticles. The optical properties of textured TiO2 films before and after spin coating of Ag nanoparticles were investigated. The angular depen- dence of the reflectance was obviously reduced by textured TiO2 surface and such effect was enhanced by Ag nanoparticles coating. A broad plasmon band of Ag grains was observed in the absorption spectrum of the textured Ag nanoparticle-coated TiO2 film.

Surface Texturing of TiO2 Film by Mist Deposition of TiO2 Nanoparticles

Abstract Unique and various microstructures of titanium oxide (TiO2) film including macroporous structure, chromatic veins and rings, have been easily fabricated by mist deposition method on silicon substrate with mild preparation conditions. Rutile phase TiO2 nanoparticles were directly used as starting material to prepare film and led to a simple preparation process. It was found that several different microstructures existed in the sample and changed with the varied positions from the center to the edge of the film when the concentration of the TiO2 suspension is 0.06 mol/l, the deposition time is 30 min, the flow rate is 1 l/min and the temperature is 150°C. The surface texturing shows apparent distinction as the concentration of the TiO2 suspension decreased to 0.03 mol/l and 0.01 mol/l.

Formation of aluminum tris (8‐hydroxyquinoline) solution in methanol and fabrication of thin films by ultrasonic spray‐assisted vapor deposition

AbstractSmall molecular material, aluminum tris (8‐hydroxyquinoline) (AlQ3), was found to be soluble in methanol under application of high ultrasonic power, and this has opened safe and environmental‐friendly solution‐based deposition of thin films. The chemical state of AlQ3 was analyzed by nuclear magnetic resonance study and the results showed there was no severe damage on AlQ3 atoms applied by high ultrasonic power. The AlQ3 films were fabricated by ultrasonic‐assisted mist deposition method on indium‐tin‐oxide. The low leakage current suggested well‐defined AlQ3 thin films without significant electrical defects such as pinholes.

Fabrication of Organic Polymer Solar Cells by a Novel Solution-Based Vapor-like Mist Deposition Method

ABSTRACTOrganic solar cells with PEDOT:PSS hole transport layer or P3HT:PCBM active layer deposited by a novel solution-based mist deposition technique were fabricated and demonstrated. The device with mist-deposited PEDOT:PSS layer showed higher short circuit current density and power conversion efficiency than those of the one with spin-coated PEDOT:PSS layers. The device with mist-deposited P3HT:PCBM layer also performed with higher power conversion efficiency. The results encourage the promising potential of the mist deposition method for device fabrication.

超音波噴霧法による透明導電膜および有機薄膜太陽電池の作製

A novel solution-based ultrasonic mist deposition method has been developed for the formation of organic solar cells. This technique enabled low-resistive gallium-doped zinc oxide (ZnO : Ga) and indium-tin-oxide (ITO) thin films capable of applying as anode layers in the device. Low resistive and flat PEDOS : PSS hole transport layer and P3HT : PCBM active layers were also deposited by this technique. The solar-cell devices with mist-deposited PEDOT : PSS or P3HT : PCBM layers showed higher short circuit current density and power conversion efficiency than those with spin-coated PEDOT : PSS or P3HT : PCBM layers. The results encourage the promising potential of the ultrasonic mist deposition method for low-cost device fabrication.

Thin Film Formation of Transparent Conductive Oxides by Solution-Based Mist Deposition Method toward Hybrid Device Applications

ABSTRACTTransparent conductive oxides, gallium-doped zinc oxide (ZnO:Ga) and tin-doped indium oxide (ITO), were fabricated by a solution-based ultrasonic spray-assisted mist deposition technique. The ZnO:Ga films showed a good c-axis orientation perpendicular to the substrate and achieved low resistivity of 2.3 × 10-3 Ω cm with high transmittance in wide wavelength region. ITO films have lower resistivity of 1.4 × 10-4 Ω cm and high transmittance over the wavelength of 300 nm.

Fabrication of conducting poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) thin films by ultrasonic spray-assisted mist deposition method

Transparent conducting polymer, poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) thin films were fabricated by a vapor-deposition technique, ultrasonic spray-assisted mist deposition method. The thickness was well controlled from 40 to 600 nm, keeping reasonable conductivity of 300–450 S/cm. The films with thickness less than 180 nm have high (> 80%) transmission over a wide (270–800 nm) spectral region. In addition, formation of ring-dot electrode pattern with a hard-mask was demonstrated, achieving lithography-less patterning. The results encourage that this deposition method is developed as an actual process technology of transparent electrodes in devices.