Abstract
AbstractSmall molecular material, aluminum tris (8‐hydroxyquinoline) (AlQ3), was found to be soluble in methanol under application of high ultrasonic power, and this has opened safe and environmental‐friendly solution‐based deposition of thin films. The chemical state of AlQ3 was analyzed by nuclear magnetic resonance study and the results showed there was no severe damage on AlQ3 atoms applied by high ultrasonic power. The AlQ3 films were fabricated by ultrasonic‐assisted mist deposition method on indium‐tin‐oxide. The low leakage current suggested well‐defined AlQ3 thin films without significant electrical defects such as pinholes.
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