In this paper, an efficient ion source with unique characteristics is introduced and proposed. It outlines the generation of a spot-dense plasma just below the plasma electrode aperture of the extractor system through the utilization of a 2.45 GHz microwave plasma source with a power of 1000 W, in the absence of a magnetic field. This source utilizes a 2.45 GHz microwave plasma generator operating at 1000 W, resulting in the generation of a spot-dense plasma just below the plasma electrode aperture of the extractor system, all achieved without the need for a magnetic field.The spot-dense plasma results in the extraction of an ion beam with high current density. Furthermore, the suggested ion source can be utilized in a smaller size using a higher frequency. Therefore, our findings indicate that the proposed method not only substantially enhances the extracted positive ion beam current but also significantly reduces the size of the ion beam source system. Based on the design and simulation results, an experimental model of the ion beam source is constructed. The diagnostic tools provided the beam current density and system efficiency values of 99mA/cm2 and 7×10−6A/W, respectively.