Improving photocatalytic properties of semi-conductor materials and Band-gap engineering are a major challenge. Herein, we report, a successful immobilization of tungsten oxide and tungstite on the surface of microporous silica by simple one-step method. The surface area decreased from 607 to 588 m 2 /g after immobilization due to the loading of tungsten oxide species on silica pores. While, the band-gap energies were found to be 2.21, 2.41 eV for SiO 2 /WO 3 and SiO 2 /WO 3 –C, respectively. Thereafter, the photocatalytic activity of the composites was studied through the oxidative degradation of sulfamethazine under UV–visible light irradiation, SiO 2 /WO 3 exhibited relatively good stability and reusability after four cycles of photocatalytic experiment in respect to the calcinated sample. The high photocatalytic activity and recyclability of the non-calcinated sample are attributed to the presence of water molecules in tungstite structure, assuming that tungsten oxide species are bonded to microporous silica via hydrogen bond interaction. • One-step immobilization of Tungsten trioxide on the surface of mesoporous silica. • The effect of tungstite and tungsten trioxide structures on the photocatalytic activity. • The role of intercalated water on the stability and reusability of the photocatalyst.
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