Solar selective coatings of HfO x /Mo/HfO 2 were deposited on copper (Cu) and stainless steel (SS) substrates using a magnetron sputtering system. The HfO x and HfO 2 layers were deposited from the sputtering of Hf target in Ar+O 2 plasma using an asymmetric bipolar-pulsed direct current generator, whereas the Mo layer was deposited from the sputtering of Mo target in the Ar plasma. The optimized HfO x /Mo/HfO 2 multilayer absorber on Cu substrate exhibited high solar absorptance ( α=0.905–0.923) and low thermal emittance ( ε 82 °C =0.07–0.09). Similarly, on SS substrates the optimized coatings exhibited α and ε 82 °C in the ranges of 0.902–0.917 and 0.15–0.17, respectively. The X-ray diffraction data showed that the HfO x /Mo/HfO 2 coating consists of tetragonal and monoclinic phases of HfO 2, which was confirmed by micro-Raman spectroscopy data. The bonding structure of the HfO x and the HfO 2 layers were confirmed using X-ray photoelectron spectroscopy data. The optical constants ( n and k), measured using spectroscopic ellipsometry, showed that the top HfO 2 layer acts as an antireflection coating and the bottom two layers (HfO x and Mo) are the main absorber layers. The analysis of the spectroscopic ellipsometric data indicated that the band gap of HfO x and HfO 2 layers were 3.90 and 5.82 eV, respectively, indicating non-stoichiometric nature of HfO x . In order to study the thermal stability of the HfO x /Mo/HfO 2 coatings, they were subjected to heat treatment in air and vacuum at different temperatures ( T A). The HfO x /Mo/HfO 2 coatings deposited on Cu substrates were thermally stable up to 400 °C for 2 h in air. Addition of a thin Mo interlayer (40 nm) in the HfO x /Mo/HfO 2 coating (i.e., Mo/HfO x /Mo/HfO 2) deposited on Cu substrates exhibited high solar selectivity ( α/ ε) of 0.872/0.09 even after heat-treatment in air up to 500 °C for 2 h. At T A=525 °C, the solar selectivity decreased drastically ( α/ ε=0.761/0.35) due to the formation of MoO 2, MoO 3 and HfMo 2O 8 phases. The Mo/HfO x /Mo/HfO 2 coatings deposited on SS substrates showed no significant changes in α and ε values after annealing at 500 °C in air and at 800 °C in vacuum. These results were confirmed by micro-Raman spectroscopy measurements, which showed the compositional stability of these coatings up to 500 °C in air and 800 °C in vacuum.
Read full abstract