As the technology of quantum computing continues to develop, the necessity of finding materials that can be used to integrate the superconducting 3D architecture becomes more essential1. The electrodeposition of metals demonstrates an attainable way to manufacture vertical superconducting interconnects. In particular, Sn is one of the promising candidates to use because of its relatively high superconducting transition temperature (Tc) at 3.7 K, as well as its excellent manufacturability and self-passivation2. To ensure a void-free filling of the via like structure, organic additives that can function as suppressors, accelerators, or levelers will be needed to tune the deposition rate in the structure. While multi-additive systems have been used to control the deposition and the fabrication of conventional Cu interconnect structures, in other cases it has been demonstrated that a single additive can also enable the filling of Cu vias by suppressing the deposition at a certain range of potentials with a breakdown of the suppression occurring at another range3-4. Because of the importance of suppressive additives used in superconformal deposition, this work looks to explore the relationship between the degree of aromaticity and the level of suppression in additive assisted electrochemical deposition of Sn. Organic surfactant molecules including Igepal CO 520 and ethoxylated α-napthalenesulfonic acid (ENSA-6) are used for the comparative study in acidic stannous sulfate electrolytes.The effects of the additives on the deposition are studied using cyclic voltammetry and chronoamperometric measurements. Both Igepal and ENSA-6 were able to suppress the deposition of tin while additives with similar molecular weight but no aromatic rings appear to have little impact. Furthermore, the suppression increases with concentrations of the additives, with varying degrees of aromaticity showing a slight difference in suppression strength. Finally, the adsorption and desorption of the additives as well as the deposition transients are studied by varying voltage sweep rate and electrode agitation, the results will be discussed in details. References Yanay, Y., Braumüller, J., Gustavsson, S., Oliver, W. D., & Tahan, C. (2020). Two-dimensional hard core Bose–Hubbard model with superconducting qubits. Npj Quantum Information, 6(1).Huang, Q. (2023). Superconductivity of electrodeposited Sn films. Journal of The Electrochemical Society, 170(3), 032506.Radisic, A., Lühn, O., Philipsen, H. G. G., El-Mekki, Z., Honore, M., Rodet, S., Armini, S., Drijbooms, C., Bender, H., & Ruythooren, W. (2011). Copper plating for 3D interconnects. Microelectronic Engineering, 88(5), 701–704.Moffat, T. P., & Josell, D. (2012a). Extreme bottom-up superfilling of through-silicon-vias by damascene processing: Suppressor disruption, positive feedback and Turing patterns. Journal of The Electrochemical Society, 159(4).
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