The present study is an effort to develop negative-permittivity, high melting point, mechanically hard, and chemically stable materials beyond commonly employed plasmonic metals such as gold and silver, which are often device incompatible in terms of real operating environments. The material studied here is titanium nitride (TiN), which possess free electron gas density similar to of gold and silver, and embodies refractory metals’ characteristics. The aforementioned advantages of TiN are taken to the next level by transforming them to oxynitrides (TiON) with a precise control in oxygen composition that can, in turn, be used to tune the electronic band structure of transition metal nitrides, opening another new dimension to transition metals nitride based plasmonics and metamaterials research. This presentation will report a pulsed laser-assisted synthesis, detailed structural characterization using x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), soft x-ray absorption spectroscopy (XAS), non-Rutherford Backscattering spectrometry (RBS), and plasmonic properties of three sets of TiN/TiON thin films. The first two sets of TiN films were grown 600 and 700 °C under a high vacuum condition. The third set of TiN film was grown in the presence of 5 mTorr of molecular oxygen at 700 °C. The purpose of making these three sets of TiN/TiON films was to understand the role of film crystallinity and role of oxygen content of TiN films on their optical and plasmonic properties. The results have shown that TiN films deposited in a high vacuum are metallic, have large reflectance, and high optical conductivity. The TiN films, grown in 5 mTorr, were found to be partially oxidized with room temperature resistivity nearly three times larger than those of the TiN films grown under high vacuum conditions. The optical conductivity these films were analyzed using a Kramers-Kronig transformation of reflectance and a Lorentz-Drude model; the optical conductivity determined by two different methods agrees very well, indicative of reliable estimate of the absolute value of reflectance in the first place. Then, it allows us to determine and analyze the complex dielectric function over a broad spectral range. We notice the existence of significant spectral weight below the interband absorptions, described by two Lorentzians, one around 250 cm-1 and one around 2,500 cm-1. We discuss here the dependence of the two bands on the deposition conditions and their effect on the plasmonic performances of TiN/TiON thin films, in particular on the surface plasmon polariton (SPP) and localized surface plasmon resonance (LSPR) quality factors.
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