In recent years, MXene has become the most demanding material in the 2D family, leading to their increased use in research for a diverse range of applications, such as energy storage, water purification, optoelectronics, electromagnetic interference (EMI) shielding and medicine. However, recent research has made it increasingly important to synthesize high-quality MXene in a safe, reliable, fast, reproducible, and good-yielding single-step method. To achieve high-quality MXene by etching the MAX phase precursors, it is very important to critically optimize synthesis parameters, such as etching method, etchant concentrations, temperature, time, etc. Minimally intensive layer delamination (MILD) method for MXene synthesis using Lithium Fluoride (LiF) salt and hydrochloric (HCl) acid seems to be a better choice in the context of improved performance in different applications as well as its scalability and reproducibility. Here, the molar ratio of HCL/LIF is critical for Aluminium etching at room temperature to produce a high-quality MXene with = O, -OH, -F termination groups in the MILD method. However, in case of MILD method the effect of LiF/HCL concentrations on quality of MXene need to be addressed. In this study, we focus on room temperature etching of Ti3AlC2 using MILD method to synthesize quasi two-dimensional carbide (Ti3C2) MXene. The influence of molarity concentration of etchants (LiF and HCl) on quality of MXene has been thoroughly investigated. Different molar concentrations of Lithium Fluoride (LiF) with fixed HCL concentration were tested at room temperature for 24 h in the etching process. The crystal structure, microstructure and composition of the MXene were characterized using X-ray diffraction, Raman spectroscopy, and electron microscopy. Flexible free-standing MXene film with largest shift in the characteristic (002) peak, indicating large interplanar spacing, has been successfully achieved repeatedly for an optimum molar concentration of etchants at room temperature.
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