We present our findings on the use of diode laser spectroscopy (DLS) for monitoring СО2, Н2О, СН4, C2H2, C2H4, NH3, and other gas impurities during low-temperature fractional distillation purification of gaseous hydrides. We demonstrate a lineup of instruments and techniques for continuously monitoring impurities during purification of hydrides: NH3, AsH3, РН3, and SiH4. The IR sources used are distributed feedback diode lasers (DLs) having a single mode output fiber pigtail and covering the near-IR spectral region, from 0.7 to 2.0 μm, where overtone and combination absorption bands of the impurities of interest are located. The systems offer high sensitivity and speed in impurity concentration measurements. Owing to their small size and low energy consumption, they can readily be integrated into a process equipment (components of fractionation columns) and enable prolonged continuous monitoring of the purity of hydrides. We describe gas concentration measurement techniques that use conventional high-resolution differential absorption spectroscopy and new, modulation correlation approaches for monitoring a weak molecular absorption by an impurity of interest against a strong selective absorption background of a matrix substance (hydride under study). We present results of technological experiments concerned with the low-temperature fractional distillation of hydrides and the degree of impurity removal from them as monitored by DLS.
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