Plasma enhanced chemical deposition (PECVD) has proven over the years to be the preferred method for the growth of vertically aligned carbon nanotubes and nanofibres (VACNTs and VACNFs, respectively). In particular, carbon nanotubes (CNTs) grown on metallic surfaces present a great potential for high power applications, including low resistance electrical contacts, high power switches, electron guns or supercapacitors. Nevertheless, the deposition of CNTs onto metallic substrates is challenging, due to the intrinsic incompatibility between such substrates and the metallic precursor layers required to promote the growth of CNTs. In particular, the formation of CNT films is assisted by the presence of a nanometric (10–100 nm) monolayer of catalyst clusters, which act as nucleation sites for CNTs. The nanometric character of the precursor layer, together with the high growth temperature involved during the PECVD process (∼700 °C), strongly favours the in-diffusion of the catalyst nanoclusters into the bulk of the metallic substrate, which results in a dramatic reduction in the nucleation of CNTs. In order to overcome this problem, it is necessary to coat the metallic substrate with a diffusion barrier layer, prior to the growth of the catalyst precursor. Unlike other conventional ceramic barrier layers, TiN provides high electrical conductivity, thus being a promising candidate for use as barrier material in applications involving low resistance contacts. In this work we investigate the anti-diffusion properties of TiN sputtered coatings and its potential applicability to the growth of CNTs onto copper substrates, using Fe as catalyst material. The barrier and catalyst layers were deposited by magnetron sputtering. Auger electron spectroscopy was used to determine the diffusivity of Fe into TiN. Morphological characterization of the CNTs coatings was performed on scanning and transmission electron microscopes. Raman spectroscopy and x-ray diffraction were employed to establish a correlation between TiN characteristics and deposition parameters.
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