High-density flexible transparent circuits (FTCs) are widely used in 5G/6G flexible transparent antennas, wearable devices, flexible transparent electronics and other fields. However, the rapid iteration and upgrading of electronic circuits present significant challenges to the manufacturing of both high-density and high-precision circuits (especially copper-based circuits) at room temperature, in an efficient and flexible manner. Here, we employ the side-etching phenomenon, which is typically avoided, to propose a novel method for hybrid additive-subtractive fabricating high-density copper-based FTCs that combines electric field-driven (EFD) microjet printing and wet etching technology. Firstly, the customized photoresist mask was flexibly printed on the copper-clad flexible substrate by EFD microjet printing, and then the copper circuit with less than the mask resolution was obtained by the side etching process of the wet etching process. By optimizing process parameters and precisely controlling the speed of the side etching stage during the etching process, the manufacturing of high-precision copper-based FTCs with a minimum line width of 2.4 μm and a minimum pitch of 4 μm was achieved. The typical sample is manufactured with a resistivity of 4 × 10−6 Ω·cm, a sheet resistance of 3.58 Ω/sq at a transmittance of up to 87.65 % (including the substrate), and it exhibits excellent mechanical stability. The prepared high-density flexible transparent interdigital electrode has excellent sensitivity, and can detect the concentration change of dilute H2SO4 solution at a minimum of 1 nmol/L at a frequency of 100–10,000 Hz. This method provides a new solution for the fabrication of copper-based FTCs at room temperature with high efficiency and low cost, and shows a good prospect for industrial application.