In the present study, electron beam lithography (EBL) is employed in the manufacturing of patterns of continuous Linde Type A (LTA) zeolite membranes. The patterns are down to the micrometer scale and they are composed of LTA micromembranes having all three dimensions in the micrometer scale. The control of the size and location of zeolite films or membranes onto specific substrates, will lead to new aspects for their use in microsensing, microelectronics and microreactor applications. Our focus is on the microsensing field, where a magnetoelastic ribbon (Metglas) is used as the sensing platform, since the Metglas/zeolite film composite has been successfully used for the detection of gases and VOCs in the past. Here we report on the first LTA zeolite micromembrane attached onto a previously EBL patterned PMMA coated Metglas substrate. The sensing ability of such a sensor could be significantly improved by using lower amount of zeolite film since it could lead to shorter response and recovery times. The conditions for the manufacturing of the LTA micromembranes onto the Metglas substrate are investigated and discussed in terms of EBL, seeding and hydrothermal synthesis parameters.