In this work, the fabrication of the nanoimprinted titanium dioxide (TiO2) gratings via thermal nanoimprinting lithography method (T-NIL) and its visible light response are studied. A polydimethylsiloxane (PDMS) primary mould, which in turn made via pattern transfer of micro/nano tracks present in the optical discs is used in T-NIL process. A transparent TiO2 film on a FTO substrate was subjected to pattern transfer from the PDMS mould. The imprinted TiO2 was post annealed to obtain anatase phase. The optical properties and photo response behaviour of plain and nanoimprinted TiO2 films were measured and compared. Raman spectroscopy measurements indicated the surface enhanced Raman scattering in imprinted samples. The imprinted TiO2 showed reduced reflectance compared to plain TiO2 films due to the increased light path length because of multiple reflections leading to in coupling of light. Photo response was observed under visible light illumination conditions, wherein imprinted TiO2 films showed appreciable photocurrent, which is otherwise very minimal in plain TiO2. The visible light photosensing in imprinted TiO2 occur due to the oxygen adsorption-desorption during the post deposition annealing and under illumination respectively. This work makes use of low-cost PDMS primary mould and T-NIL at favourable temperature and pressure conditions with a promising outlook for fabricating imprinted TiO2 with photo sensing ability and adaptability for large area upscaling.