Chalcogenide semiconductors have emerged as promising candidates for next-generation optoelectronics, mainly benefiting from their cost-effective processability, chemical versatility, and excellent stability. However, the device performance is limited by the complex defect characteristics, necessitating a detailed understanding of the defect density, types, and distribution. This study employs optical injection deep level transient spectroscopy to characterize the trap features of antimony bismuth sulfide-based heterojunctions. Photoexcitation offers the possibility to determine the spatial distribution of traps. It reveals distinct distributions of hole and electron traps. Short-wavelength light (570 nm) detects hole traps near the hole transport layer, while long-wavelength light (830 nm) identifies electron traps near the electron transport layer. Additional intermediate-wavelength tests (670 and 755 nm) and light field distribution simulation further elucidate the trap distribution. Transient absorption and transient photocurrent also support the non-uniform trap distribution within the chalcogenide-based photodiodes.
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