Abstract In this study, we grew (010)-oriented epitaxial films of brownmillerite-structured SrCoO2.5 on various substrates whose lattice mismatch against SCO ranged from 0 to -2.9% by pulsed laser deposition and investigated the effect of substrate-induced strain on their protonation in field effect transistor structures with gate layers consisting of Nafion membranes. We found that the H concentration of the SCO films that were fully compressive-strained by up to 1.3 % was ~1.7 and that it was almost independent of the magnitude of the substrate-induced strain. We also found that the H content of the strain-partially-relaxed film with a residual compressive strain of 1.3% was lower, ~1.3. These results indicate that lattice deformations arising from substrate-induced strain have insignificant effects on protonation, while lattice defects and dislocations introduced upon strain relaxation, which hinders proton diffusion in the films’ lattices, dominantly affect protonation in SrCoO2.5 films
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