AbstractWe have performed detailed investigations of the optical properties of strain‐free In‐rich InxGa1–xN (0.61 ≤ x ≤ 1.0) films that were grown directly on (0001) sapphire substrates by radio‐frequency plasma‐excited molecular beam epitaxy. In‐composition dependence of photoluminescence peak energy for the InxGa1–xN films, measured at room temperature, exhibited a monotonic and smooth decrease with the increase in the In‐composition, approaching to 0.66 eV of a strain‐free InN film that was also grown directly on the sapphire substrate. The energy bowing parameter, b was determined to be 1.8 eV using these strain‐free InxGa1–xN films. Structural properties of these films are also investigated in detail. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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