Journal Article Combining in-Situ SEM with High Sensitivity Analytical TEM for Understanding the Degradation of Metallic Interconnects in SOFC Get access Stéphane Poitel, Stéphane Poitel Centre Interdisciplinaire de Microscopie Electronique, Ecole Polytechnique Fédérale de Lausanne, Lausanne, SwitzerlandGroup of Energy Materials, Ecole Polytechnique Fédérale de Lausanne, Sion, Switzerland Search for other works by this author on: Oxford Academic Google Scholar Zhu-Jun Wang, Zhu-Jun Wang Department of Inorganic Chemistry, Fritz Haber Institute of the Max Planck Society, Berlin, Germany Search for other works by this author on: Oxford Academic Google Scholar Marc Willinger, Marc Willinger Department of Inorganic Chemistry, Fritz Haber Institute of the Max Planck Society, Berlin, Germany Search for other works by this author on: Oxford Academic Google Scholar Jan van Herle, Jan van Herle Group of Energy Materials, Ecole Polytechnique Fédérale de Lausanne, Sion, Switzerland Search for other works by this author on: Oxford Academic Google Scholar Cécile Hébert Cécile Hébert Centre Interdisciplinaire de Microscopie Electronique, Ecole Polytechnique Fédérale de Lausanne, Lausanne, Switzerland Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 23, Issue S1, 1 July 2017, Pages 2060–2061, https://doi.org/10.1017/S1431927617010960 Published: 04 August 2017