Atomic layer deposition (ALD) of vanadium oxide is a viable means to add pseudocapacitive layers to porous carbon electrodes. Two commercial activated carbon materials with different surface areas and pore structures were acid treated and coated by V2O5 ALD using vanadium triisopropoxide and water at 150 °C. The V2O5 ALD process was characterized at various temperatures to confirm saturated ALD growth conditions. Capacitance and electrochemical impedance analysis of subsequently constructed electrochemical capacitors (ECs) showed improved charge storage for the ALD coated electrodes, but the extent of improvement depended on initial pore structure. The ALD of V2O5 onto mesoporous carbon increased the capacitance by up to 46% after 75 ALD cycles and obtained a maximum pseudocapacitance of 540 F/g(V2O5) after 25 ALD cycles, while maintaining low electrical resistance, high columbic efficiency, and a high cycle life. However, adding V2O5 ALD to microporous carbons with pore diameters of <11 A showed far less...
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