Influence Of Deposition Parameters Research Articles

Preparation and characterisation of gradient HA/TiN/Ti coatings for biomedical applications

A gradient transition HA/TiN/Ti composite coating was deposited on the surface of medical Ti6Al4V alloy using the reactive magnetron sputtering technique. The influence of deposition parameters on the microstructure, mechanical properties, corrosion resistance, and in vitro mineralisation of the coating were systematically investigated. The results demonstrated that deposition parameters such as sputtering power, bias voltage, and sputtering pressure had a significant impact on the microstructure and morphology of HA/TiN/Ti composite coatings. The gradient TiN/Ti transition layer remarkably enhanced the adhesion strength, increasing the critical load from 7.5 N (HA monolayer) to over 40 N (HA/TiN/Ti multilayer). Moreover, compared to single TiN/Ti and HA coatings, the HA/TiN/Ti composite coatings exhibited better corrosion resistance and metal ion shielding ability while also demonstrating excellent capability for inducing bone-like apatite formation, thereby greatly ensuring the exceptional stability of the surface bioactive coatings.

Optimization of Black Nickel Coatings’ Electrodeposit onto Steel

Coatings can be created using various technologies and serve different roles, including protection, functionality, and decorative purposes. Among these technologies, electrodeposition has emerged as a low-cost, versatile, and straightforward process with remarkable scalability and manufacturability. Nickel, extensively studied in the context of electrodeposition, has many applications ranging from decorative to functional. The main objective of the present work is the electrodeposition of double-layer nickel coatings, consisting of a bright nickel pre-coating followed by a black nickel layer with enhanced properties, onto steel substrates. The influence of deposition parameters on colour, morphology, adhesion, roughness, and coefficient of friction was studied. The effects of cetyltrimethylammonium bromide (CTAB) and WS2 nanoparticles on the coatings’ properties and performance were also investigated. Additionally, the influence of the steel substrate’s pre-treatment, consisting of immersion in an HCl solution, prior to the electrodeposition, to etch the surface and activate it, was evaluated and optimized. The characterization of the pre-coating revealed a homogeneous surface with a medium superficial feature of 2.56 μm. Energy dispersive X-ray spectroscopy (EDS) results showed a high content of Ni, and X-ray diffraction (XRD) confirmed its crystallinity. In contrast, the black films’ characterization revealed their amorphous nature. The BN10 sample, which corresponds to a black nickel layer with a deposition time of 10 min, showed the best results for colour and roughness, presenting the lowest brightness (L*) value (closest to absolute black) and the most homogeneous roughness. EDS analysis confirmed the incorporation of WS2, but all samples with CTAB exhibited signs of corrosion and cracks, along with higher coefficient of friction (COF) values.

Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography.

The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.

Influence of Deposition Parameters on Performance of Zn(O,S) Buffer Layer Deposited by Solution-Based Continuous Flow Reactor for CIGS Solar Cells

CdS thin films are commonly used as buffer layers in hetero-junction structured CIGS thin film solar cells. However, the toxicity of Cd has raised concerns regarding environmental safety and alternative materials have been explored. ZnS is a leading candidate to replace Cd, with the presence of Zn(O,S) impurities known to be required for efficient CIGS solar cell fabrication. In this study, we synthesized Zn(O,S) films using a solution-based deposition method combining a continuous flow reactor (CFR) with another solutionbased deposition method. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to characterize the structural and physicochemical properties of the films, confirming the efficacy of the CFR process for depositing Zn(O,S) thin films in a short period of time. We successfully deposited Zn(O,S) thin films using the combined CFR process. Cd-free B:ZnO/Zn(O,S)/CIGS solar cells were fabricated on Mo-coated glass substrates to investigate the effects of experimental parameters, such as deposition time and method, on the performance of the Zn(O,S) buffer layer in the devices.

Efficient formaldehyde sensor based on PtPd nanoparticles-loaded nafion-modified electrodes

The noble metal-based electrochemical sensor design for efficient and stable formaldehyde(FA) detection is important ongoing research. In this paper, PtPd/Nafion/GCE is prepared by electrochemical cyclic voltammetry deposition method based on electrodepositing nanostructured platinum (Pt)-palladium (Pd) nanoparticles in Nafion film-coated glassy carbon electrode (GCE). The influence of deposition parameters and chemical composition (atomic ratio of Pt and Pd) on the electrochemical behaviour of PtPd/Nafion/GCE has been investigated. PtPd/Nafion/GCE displays a remarked electrocatalytic activity for the oxidation of FA and exhibits a linear relationship in the range of 10–5000 μM, with a detection limit of 3.3 μM in 0.1 M H2SO4 solution. It is proved that the detection performance of PtPd/Nafion/GCE electrode is valuable for further application with low detection limit, wide linear range, favourable selectivity and high response.

High-throughput thermodynamic analysis of the CVD of SiC from the SiCl4-CH4-H2 system

A high-throughput thermodynamic analysis based on the CALPHAD approach is employed in this study to gain insights into the chemical vapor deposition (CVD) of SiC from the SiCl4-CH4-H2 system using up-to-date thermodynamic databases. The explored deposition conditions, i.e., temperature, pressure, C/Si ratios and H2/SiCl4 ratios, ranges from 800 to 1800 °C, 400 to 40,000 Pa, 0.1 to 10 and 0.1 to 200, respectively. In addition to the metrics of deposit purity and deposition efficiency of SiC, a new metric, i.e., the utilization efficiency of precursors, is proposed in this work to facilitate the identification of the optimal deposition conditions. The influence of deposition parameters and precursor compositions on the compositions and phase stabilities of the condensed and gas phases pertinent to vapor processing are elucidated. The results show that the deposit purity is more sensitive to temperature than pressure. The optimal conditions to achieve high deposit purity (100 %), deposition efficiency (99.74 %) and the utilization efficiency of precursors (99.74 %) locate on the C/Si ratios between ~0.8 and ~ 1, H2/SiCl4 ratios above 8, low pressure (below 10 kPa) and medium temperatures (~ 1000 to ~1400 °C). Furthermore, low C/Si ratios (< 0.5) and high C/Si ratios (> 1) lead to the formation of free Si and graphite, respectively.

Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering

Tungsten coatings were deposited on silicon substrates by radio frequency (rf) magnetron sputtering from a metallic target in Ar atmosphere. The process parameters during the sputtering process were evaluated by a Langmuir probe, particularly, the electron density and electron temperature were measured by changing the rf power and gas pressure. The morphological and structural properties of the coatings were studied as a function of the pressure. Significant correlations were found between process parameters and characteristics properties of W coatings. The influence of deposition parameters on electrical properties was investigated. The electrical resistivity of the coatings was increased from 1.3 × 10−6 to 3 × 10−5 Ω m as the pressure increased as well.

On the Influence of Manufacturing Parameters on the Microstructure, Mechanical Properties and Corrosion Resistance of AISI 316L Steel Deposited by Laser Engineered Net Shaping (LENS®).

Samples of 316L SS were manufactured by Laser Engineered Net Shaping (LENS®) using different technological parameters. The deposited samples were investigated in terms of microstructure, mechanical properties, phase content and corrosion resistance (salt chamber and electrochemical corrosion). Parameters were chosen to obtain a proper sample built for layer thicknesses of 0.2, 0.4 and 0.7 mm by changing the laser feed rate while keeping the powder feed rate constant. After a comprehensive analysis of the results, it was found that the manufacturing parameters slightly affected the resulting microstructure and also had a minor impact (almost undetectable considering the uncertainty of the measurement) on the mechanical properties of samples. Decreases in resistance to electrochemical pitting corrosion and environmental corrosion with an increased feed rate and a decrease in layer thickness and grain size were observed; however, all additively manufactured samples were found to be less prone to corrosion than the reference material. In the investigated processing window, no influence of deposition parameters on the phase content of the final product was found-all the samples were found to possess austenitic microstructure with almost no detectable ferrite.

Structural optimization for porous thermal barrier coating and analysis of thermomechanical properties by experimental and computational investigation

The porous thermal barrier coatings (TBCs) play a pivotal role in aircraft industry by improving the energy efficiency of TBCs system. Specifically, the pore structure features are significant factors for the performance of porous TBCs. However, atmospheric plasma spraying (APS), as a commonly used TBCs deposition technology, is difficult to control the geometric characteristics and distribution of pores. In this situation, an attempt has been carried out in this study to produce porous TBCs with controlled pore characteristics by delivering pore former using the plasma co-spraying technique. The influence of deposition parameters on pore geometry and distribution was analyzed in this process. To clarify the influence of pore structure features on thermomechanical properties of the coatings, experimental and finite element simulations were developed. The results suggested that pore content, perimeter, aspect ratio (A/R), and distribution can be effectively regulated by the method developed in this study. The coatings with lower elastic modulus and thermal conductivity were obtained with increased porous embedded particle clusters (PEPC) area fraction. The transverse distributed flattened shuttle-shaped PEPC in the coating has a larger perimeter and A/R value, resulting in superior potential in reducing the thermal conductivity and producing a greater elastic modulus.

Influence of Deposition Parameters on Hardness Properties of InconelTM 718 Processed by Laser Powder Bed Fusion for Space Applications

InconelTM 718 is widely used for commercial application in aerospace industry and additive manufacturing process allows for versatile design and manufacturing opportunities. In the present research, the results of a wide experimental campaign run on additive manufactured InconelTM 718 specimens obtained with different processing parameters are presented. In particular, the influence of process parameters (for both vertical and horizontal planes with respect to the building direction) on the hardness properties are investigated. A further investigation is performed on the optimal hardness testing procedure for additive manufacturing. The research is extended to as-built and heat-treated specimens. The new insight gained is that the orientation of the printing direction with respect to indentation direction can be responsible for scattering in hardness measurements and indentation size effect. As-built specimens show a strong anisotropy for in-plane and growth directions and an increment of hardness with respect to increasing energy density. The difference between hardness value with respect to the energy density and the measurements scattering are reduced by the heat treatment. A careful handling of hardness data is required when dealing with additive manufactured materials.

Nanostructured TiAlCuN and TiAlCuCN coatings for spacecraft: effects of reactive magnetron deposition regimes and compositions.

Spacecraft are exposed to a number of factors in the outer space: irradiation by electron flows, high-energy ions, solar electromagnetic radiation, plasma irradiation, and a stream of meteorite particles. All these factors initiate various physical and chemical processes in spacecraft materials, which can eventually lead to failure. To ensure reliable operation of spacecraft, it is necessary to use protective coatings and special radiation-resistant materials. TiAlCuN and TiAlCuCN coatings were formed by reactive magnetron sputtering on different substrates: single-crystal silicon and Titanium Grade 2 wafers. Nitrogen was used as a reactive gas to form nitride coatings and acetylene was used to form carbonitride coatings. The elemental composition was studied by energy-dispersive X-ray (EDX) spectroscopy. The structural-phase state of the coatings was examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Mechanical properties, such as hardness and Young modulus, were investigated by nanoindentation using a CSM Instruments Nanohardness Tester NHT2. The influence of deposition parameters, such as Ti and Al contents, the degree of reactivity α, and carbonitride formation on the structure and their mechanical properties were considered. It was detected that Cu addition to the coatings has effects on crystallite and growth column size refinement in comparison with the TiAlN and TiAlCN analogues due to its segregation along crystalline boundaries, and thus, imparts better mechanical characteristics. The hardness of TiAlCuN and TiAlCuCN coatings varies in the range of H = 25-36 GPa and Young modulus - E = 176-268 GPa. The impact strength index and the H/E* ratio, as well as the plastic deformation resistance index H3/E*2, were calculated. Due to their high mechanical properties, the formed nitride and carbonitride coatings are promising for use in space technologies.

Structure and chemical composition of thin-film nanocomposites based on silver in organosilicon amorphous matrix prepared by High Target Utilization Sputtering

Thin films based on Ag nanoclusters embedded in an organosilicon polymer matrix were deposited using the High Target Utilization Sputtering technique (HiTUS) by simultaneous sputtering of the Ag target and polymerization of hexamethyldisiloxane (HMDSO) vapors in radiofrequency plasma. The influence of deposition parameters on chemical composition and structure of the deposited nanocomposite films was studied using scanning electron microscopy, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and X-ray diffraction analytical techniques. The films under investigation exhibit a dense uniform structure with the metallic nanocrystalline silver present in the form of spherical-shaped nanoclusters with dimensions below 10 nm embedded in an amorphous organosilicon plasma polymer. The average size of Ag nanoclusters is increased from 1.8 to 4.4 nm with Ag content increasing from 16 to 57%at. while concentration of nanoclusters is reduced. Incorporation of the metallic silver into the plasma polymerized HMDSO leads to a decrease of carbon and oxygen content as well as a decrease of organosilicon polymer matrix density.

Parameters to be considered for the development of highly photoactive TiO2 layers on aluminium substrates by RF magnetron sputtering for treating polluted air

In this study, photoactive titanium dioxide films deposited on aluminium substrates using Radio-Frecquency (RF) magnetron sputtering have been developed, with the goal of advancing this technology for indoor air treatment. With this goal in mind, the influence of deposition parameters, namely post annealed heat treatment, working pressure and deposition time, on the physico-chemical properties of the layers has been studied. Photocatalytic efficiency for trichloroethylene degradation in gas phase, and self-cleaning performance of the developed materials have been evaluated. Samples have been thoroughly examined using different techniques (SAXRD, UV-Vis, SEM-EDX, contact angle, profilometry, hardness, among others) in order to determine the structural-photocatalytic relationship. The findings indicate that high-temperature annealing promotes the diffusion of alumina, copper and iron ions towards the surface of the samples resulting in the formation of aluminium alloys. These alloyed species can act as recombination centres adversely affecting the photocatalytic activity. The sputtering pressure also affects the nature of the titanium phases formed during the sputtering. Increasing the thickness of the TiO2 layer leads to rougher surfaces with TiO2-anatase as the predominant crystal phase. Annealing temperatures of 350 °C, argon pressures between 0.8 and 1.0 Pa, and TiO2 layer thickness of ca. 110 nm are the optimal conditions to prepare well-adhered TiO2 layers with high photocatalytic performance. UV-A photoinduced superhydrophilicity phenomena was observed for all TiO2/Al materials.

Experimental investigation on deposits of ER70S-6 wire on SiO2 substrate using non-transferred arc-based wire arc additive manufacturing

Recent trends in additive manufacturing (AM) are to produce geometrically complex structures at minimal wastage of material, time and cost without sacrificing part quality and mechanical performance and to introduce ease in processing and part removal. Here, a non-transferred arc (NTA)-based wire arc additive manufacturing (WAAM) system has been developed to achieve the above objectives, where the arc is only generated between tungsten electrode and consumable filler wire. No electrical contact with the substrate facilitate deposits even on the non-conductive substrate surface, which helps to remove the final deposits easily. The influence of deposition parameters (welding current, voltage, wire feed speed (WFS) and travel speed) on response characteristics (bead uniformity, height deviation, droplet diameter, and droplet transfer frequency) is studied on a multi-performance level using grey relational analysis (GRA). Then, single- and multi-bead layer is fabricated over SiO2 substrate for ease in part removal after complete fabrication. WFS is referred to as a key deposition parameter that influences all deposition characteristics. It has been observed that NTA-based WAAM results in high bead uniformity with minimal spatter and low bead height difference between start and exit arc point. Complete ferrite microstructure with few pearlites is observed on the deposits with similar elemental composition on the top, bottom and interface surfaces. X-ray diffraction (XRD) study reveals ferrite diffraction planes ({110}, {200}, {211} and {220}) with no intermetallic formations on deposits. Also, compressive residual stress with less variation in crystallite size, stress, strain and microhardness among the top, bottom and lateral deposit surfaces indicates the fabricated part’s isotropic nature.

Stepwise sulfurization of MoO3 to MoS2 thin films studied by real-time X-ray scattering

Chemical vapor deposition (CVD) is commonly used for the large-scale synthesis of the films of two-dimensional (2D) transition metal dichalcogenide (TMD) materials, including MoS2 thin films, which have potential applications in optoelectronics, catalysis, and nanoelectronics. As far as thin film of MoS2 is concerned, the influence of deposition parameters on the chemical reactions in the growth process via CVD synthesis has not yet been exhaustively studied. Here we present a comprehensive, time-resolved, in-situ study of the growth of MoS2 thin film from MoO3 by sulfurization using the grazing-incidence wide-angle X-ray scattering (GIWAXS) in laboratory conditions. We tracked the basic chemical reactions during the sulfurization process in real time by monitoring the phase transformations of MoO3 to MoO2 and MoO2 to MoS2 via a MoOS2 transient phase, although it was not possible to observe it directly. Preferential crystallographic orientation of MoO3, and MoO2 phases during the growth was confirmed. In addition, their activation energies were determined from the crystallization kinetics parameters. The present work highlights the importance of understanding the basic chemical reactions inside the CVD reactor as a prerequisite for optimizing the properties of the final 2D TMD films.

Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering

The titanium nitride (Ti2N) films have good mechanical properties, such as high hardness and chemical stability, giving Ti2N good resistance to wear and corrosion. The properties of films deposited by PVD techniques are determined by their structure, microstructure, composition, and morphology that depend on the deposition parameters, such as substrate temperature, vacuum pressure, and the distance between the target and the substrate. The influence of these parameters has been studied individually. This work studied the structure, morphology, composition, and electrochemical behavior of Ti/Ti2N films deposited by RF-magnetron sputtering on carbon steel, such as a function of the power of the RF source, substrate temperature, and the target to substrate distance and the Ar/N2 ratio. The film structure was analyzed by X-ray diffraction (XRD), the morphology of cross-section by SEM, the semi-quantitative composition by EDS, and the electrochemical properties was studied by open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy techniques. The films showed two phases of Ti and Ti2N. The SEM-EDS exhibited a morphology according to the Stranski–Krastanov or layer-plus-island growth model. The substrate temperature of 450 °C strongly influences the electrochemical properties.

Photocatalytic Coatings Based on TiOx for Application on Flexible Glass for Photovoltaic Panels

In this work, the photocatalytic properties of thin films based on titanium oxides for application on flexible glass in photovoltaic panels were presented. Thin films were prepared by gas impulse magnetron sputtering (GIMS), where the gas injection on a target was synchronized in time with the electric pulse supplying the magnetron with the Ti target. The deposition process was carried out under various Ar/O2 atmospheres (with a content of 5–8% O2). The as-deposited TiOx films were non-stoichiometric. The influence of deposition parameters on optical properties, microstructure, hardness, and elastic modulus was examined. In addition, the dependence between the oxygen content in the sputtering atmosphere and the photocatalytic activity of the coatings was examined. The scratch resistance of the coatings and their adhesion to flexible glass were also investigated. It has been shown that the GIMS technique can be used for efficient deposition of non-stoichiometric TiOx coatings on substrates sensitive to the temperature as thin flexible glass and, at the same time, characterized by high adhesion. The TiOx-based semiconductor coatings prepared in this study can be used successfully in transparent electronics and in the construction of modern photovoltaic panels due to their photocatalytic activity, high hardness, and high level of transparency.

Influence of deposition parameters on the behavior of nitro-cobalt-based and Ti-hexafluoride-based pretreatments

Influence of deposition parameters on the behavior of nitro-cobalt-based and Ti-hexafluoride-based pretreatments

Influence of Deposition Parameters on Structural Properties of Inconel™ 718 Processed by Selective Laser Melting for Space Applications

Influence of Deposition Parameters on Structural Properties of Inconel™ 718 Processed by Selective Laser Melting for Space Applications

Non-equilibrium methods for synthesis and modification of gallium oxide

Synthesis and modification of gallium oxide as a wide-bandgap semiconductor is a topical task in the fields of power electronics, UV detectors, gas sensors, telecommunication. In the present work, the Ga2O3 films deposited on sapphire substrates by magnetron sputtering have been studied. The influence of deposition parameters and subsequent annealing on the structure and optical properties of the synthesized films is analyzed. Ion doping of magnetron-deposited films with silicon is carried out by the ion implantation method. It is shown by the Raman scattering and optical transmission spectroscopy that ion irradiation leads to the disordering of the crystal structure, but subsequent annealing results in a partial recovery of the structure. Hall-effect measurements for irradiated and then annealed films do not reveal the formation of a conducting layer. Apparently, this is due to the fact that the main contribution to the resistance is made by grain boundaries in the magnetron-deposited films.