Influence Of Deposition Parameters Research Articles

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

AbstractThe paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.

Influence of Deposition Parameters on the Properties of Nanocomposite Coatings Prepared by Cathodic Arc Evaporation

The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties

Microstructure and properties of TiCrN coatings by arc ion plating

TiCrN coatings were deposited onto high-speed steel substrates by arc ion plating. The crystalline structure of the coatings was analysed by X-ray diffraction. Influence of both negative bias applied to the substrates and nitrogen flowrate on the crystalline structure was investigated. Scanning electron microscopy was employed to observe the surface quality of the coatings. Hardness of the coatings was measured by the XP nanoindenter. It is indicated that both size and quantity of the macroparticles decrease with increasing negative bias. TiCrN coatings with enhanced hardness can be obtained when a larger negative bias is applied. Increasing nitrogen flowrate benefits hardness of the coatings as well. Compared with the TiN thin film, the TiCrN coatings exhibit better mechanical behaviour due to the solid solution strengthening effects caused by the doped Cr atoms. Influence of deposition parameters on the structure and mechanical properties has been discussed.

Growth of simplified buffer template on flexible metallic substrates for YBa2Cu3O7-δ coated conductors

A much simplified buffer structure, including a three-layer stack of LaMnO3/MgO/composite Y2O3–Al2O3, was proposed for high performance YBa2Cu3O7-δ (YBCO) coated conductors. In this structure, biaxially textured MgO films were prepared on solution deposition planarized amorphous substrate through ion-beam-assisted deposition (IBAD) technology. By the use of in situ reflection high-energy electron diffraction monitor, X-ray diffraction and atomic force microscope, the influence of deposition parameters, such as film deposition rate, ion penetrate energy and ion beam flux, on crystalline orientation, texture, lattice parameter and surface morphology was systematically investigated. Moreover, stopping and range of ion in mater simulation was performed to study the effects of ion bombardment on MgO films. By optimizing IBAD process parameters, the best biaxial texture showed ω-scan of (002) MgO and Φ-scan of (220) MgO yield full width at half maximum values of 2.4° and 3.7°, indicating excellent biaxial texture. Subsequently, LaMnO3 films were directly deposited on the IBAD-MgO template to improve the lattice mismatch between MgO and YBCO. Finally, YBCO films grown on this simplified buffer template exhibited a critical current density of 2.4 MA/cm2 at 77 K and self-field, demonstrating the feasibility of this buffer structure.

Electrodeposition and characterization of Ni–Mo–ZrO2 composite coatings

Ni–Mo–ZrO2 composite coatings were produced by electrodeposition technique from citrate electrolytes containing dispersed ZrO2 nanopowder. The influence of deposition parameters i.e. concentration of molybdate and ZrO2 nanoparticles in the electrolyte, bath pH and deposition current density on the composition and surface morphology of the coating has been investigated. The structure, microhardness and corrosion properties of Ni–Mo–ZrO2 composites with different molybdenum and ZrO2 content have been also examined. It was found that ZrO2 content in the deposit is increased by rising the nanoparticles concentration in the plating solution up to 20gdm−3. An increase in molybdate concentration in the electrolyte affects negatively the amount of codeposited ZrO2 nanoparticles. The correlation between the deposition current efficiency and ZrO2 content in the composite coating has been also observed. A decrease in deposition current efficiency leads to deposition of Ni–Mo–ZrO2 composite with low nanoparticles content. This may be explained by formation of higher amounts of gas bubbles on the cathode surface, which prevent the adsorption of ZrO2 nanoparticles on the growing deposit. The XRD analysis revealed that all the studied Ni–Mo–ZrO2 coatings were composed of a single, nanocrystalline phase with FCC structure. It was found that the incorporation of ZrO2 nanoparticles into Ni–Mo alloy matrix affects positively the microhardness and also slightly improves the corrosion properties of Ni–Mo alloy coating.

Effects of RF Sputtering Parameters on C-axis Aligned Crystalline (CAAC) InGaZnO4 Films Using Design of Experiment (DOE) Approach

The influence of deposition parameters on the properties of RF sputter deposited c-axis aligned crystalline (CAAC) IGZO was studied using both single parameter and design of experiment (DOE) analysis (target composition near InGaZnO4). Use of a 3-level, 6 factor Box-Behnken DOE enabled efficient sampling of the large processing parameter space. Deposition temperature and power, oxygen fraction in the sputter gas, and the ensuing Zn composition were identified as the key parameters correlated with c-axis texture in the films. CAAC formation commenced at a deposition temperature of 250°C reaching maximum surface normal alignment near 315°C. Crystallinity and alignment increased rapidly with oxygen fraction becoming nearly independent of fraction between 10% and 50%. Zinc loss during deposition at high temperatures and low oxygen partial pressures correlated with lower crystallinity, suggesting a strong composition dependence of CAAC formation in IGZO alloys. In contrast, increased deposition power improved alignment. Optimal deposition conditions were identified and related to a proposed nucleation and growth model.

Residual stress and texture in Aluminum doped Zinc Oxide layers deposited by reactive radio frequency magnetron sputtering

Aluminum doped Zinc Oxide thin films were deposited on standard soda-lime substrates by reactive radio frequency magnetron sputtering. Residual stress and texture were studied by X-ray diffraction, while X-ray Absorption Near Edge Spectroscopy provided information on the Al environment in the best performing thin films. The influence of deposition parameters on structural and microstructural properties is discussed. A correlation between microstructure and residual stress state with electrical and optical properties is proposed.

Chalcogenide Thin Films Prepared using Chemical Bath Deposition Method: Review

The aim of this study is to discuss the synthesis of thin films using chemical bath deposition method. In recent years, studies of thin films of different groups have attracted great attention due to their applications are possible in many areas of modern technology. Researchers have deposited binary, ternary and quaternary thin films from aqueous solutions using chemical bath deposition method. Here, the growth of metal sulfide, selenide and telluride thin films has been reported. The influence of deposition parameters on the physical properties of films was investigated. The research findings indicate that an increase in deposition time allows more materials to be deposited onto the substrate. Morphological studies of films show that the films thicknesses were increased as the bath temperature was increased.

Room Temperature Electrodeposition of Metallic Magnesium from Ethylmagnesium Bromide in Tetrahydrofuran and Ionic Liquid Mixtures

The redox processes, nucleation-growth mechanisms and magnesium (Mg) speciation associated with the room temperature electrodeposition of metallic Mg on an aluminum (Al) electrode are described from mixed deposition media composed of 0.095 M ethylmagnesium bromide (EtMgBr)/tetrahydrofuran (THF) and 0.54 M ionic liquid including: 1-butyl-1-methylpyrrolidinium tris(pentafluoroethyl)trifluorophosphate ([Py14][FAP]), 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide ([Py14][TFSI]), 1-butyl-1-methylpyrrolidinium bis(fluorosulfonyl)imide ([Py14][FSI]), 1-butyl-1-methylpiperidinium bis(trifluoromethylsulfonyl)imide ([Pip][TFSI]), ethyldimethylpropylammonium bis(trifluoromethylsulfonyl)imide ([N1123][TFSI]) and diethylmethyl (2-methoxyethyl) ammonium bis(trifluoromethylsulfonyl)imide ([DEME][TFSI]). Cyclic voltammetric results show a chemically reversible Mg/Mg2+ process in the case of [FAP]− and [TFSI]− based ionic liquids, but not for the [FSI]− based one, ascribed to ionic liquid dependent Mg speciation. Analysis of chronoamperometric data reveal that in the presence of [Py14][FAP] and [Pip][TFSI], Mg nucleation follows a 3D instantaneous nucleation and diffusion controlled semi-spherical growth model. However, in the case of [Py14][TFSI], [DEME][TFSI] and [N1123][TFSI], deviations from this model are evident. The influence of deposition parameters, such as current density and deposition time, on appearance, crystallite size and preferred orientation of Mg are also reported in a deposition medium containing 90% 1 M EtMgBr/THF and 10% ionic liquid (v/v ratio). [Py14][FAP] was found to be the most favourable ionic liquid for electrodepositon of Mg.

(Invited) Optimization of Pulsed Electrodeposited Bi2Te3-Based Thin Films from DMSO Solution: Influence of Deposition Parameters, Electrolytic Bath Composition and Annealing

Bismuth telluride based alloys have been extensively investigated for thermoelectric power generation (TEG) and cooling near room temperature applications. To employ materials in TEG, requires materials with large Seebeck coefficient (S), high electrical conductivity (s) and low thermal conductivity (k) to achieve a high thermoelectric efficiency defined by zT = S2σ T/ k, where T is the absolute temperature at which properties are measured. Nanostructured materials, specifically mesoscale composites showed improved zT values due to the reduction in thermal conductivity without reducing the electrical conductivity [1]. However, most of these materials are being fabricated through alloying using high temperature and pressure [2, 3], and thereby not scalable in terms of Si based fabrication processes. The growing demand of miniaturized room temperature thermoelectric devices based on bismuth telluride alloys has led to research focused on synthesizing thin films, in particular, using electrochemical deposition. Electrodeposition of thin films is a facile, low cost process without the need for sophisticated high-vacuum equipment in contrast to the physical deposition methods [4-6], which is also Si-Fab compatible. The electrodeposition of bismuth telluride alloy films has been reported in the literature [2-4]. The challenge, however, is to achieve bulk-like thermoelectric properties in the electroplated thin films. A comprehensive analysis of the literature demonstrates that the composition of bismuth telluride alloys plays a pivotal role in determining their thermoelectric properties [3, 4]. Schumacher et al., reported that the Seebeck coefficient of (BixSb1-x)2Te3 thin film increases after annealing the films in tellurium (Te) atmosphere for 60 h which is attributed to the improved Te content in the annealed films [4]. The objective of the present work is to synthesize electrodeposited p and n-type bismuth telluride alloy based thin films and to optimize the thermoelectric properties similar to the bulk by tuning the composition of the films. Here, we studied comprehensively the influence of electrolytic bath content, deposition potential and annealing on the composition of as-deposited films and in turn on the thermoelectric properties. The impact of annealing temperature on the films composition, structure and the Seebeck coefficient is discussed. The annealed p- and n-type thin films exhibit a room temperature Seebeck coefficient of about 175 and -160 μVK-1 respectively, which is similar to the bulk materials [3]. Structural and chemical investigations of the as-deposited and annealed thin films are performed with X-ray diffraction, scanning electron microscopy and energy dispersive X-ray analysis. Thus, we synthesize the electroplated thin films based on bismuth telluride and optimize its composition and micro-structure by adjusting the deposition parameter and annealing temperature to enhance the thermoelectric properties. Acknowledgements This work is financially supported by Enterprise Ireland and Analog Devices, Limerick, Ireland under Innovation Partnership project IP-2012-0197.

45.2: Effects of RF Sputtering Parameters and Film Composition on C‐Axis Aligned Crystalline (CAAC) IGZO Films

The influence of deposition parameters on the properties of RF sputter deposited c‐axis aligned crystalline (CAAC) IGZO was evaluated using both single parameter and design of experiment (DOE) analysis. Deposition temperature and oxygen partial pressure were found to be primary parameters determining CAAC alignment and crystallinity. CAAC is first formed at a deposition temperature of 185°C, reaching optimal surface normal alignment at ∼315°C. Crystallinity and alignment increase rapidly with oxygen fraction up to 10%, then becoming nearly independent up to 50%. The Zn fraction and (Ga+Zn)/In ratio were identified as key parameters correlated to c‐axis texture in the films. Zinc loss during deposition at high temperatures and low oxygen partial pressures correlated with poor CAAC alignment, while (Ga+Zn)/In ratio approaching an ideal 2.0 ratio exhibited improved CAAC crystallinity.

Impact of sputter deposition parameters on molybdenum nitride thin film properties

Molybdenum and molybdenum nitride thin films are presented, which are deposited by reactive dc magnetron sputtering. The influence of deposition parameters, especially the amount of nitrogen during film synthesization, to mechanical and electrical properties is investigated. The crystallographic phase and lattice constants are determined by x-ray diffraction analyses. Further information on the microstructure as well as on the biaxial film stress are gained from techniques such as transmission electron microscopy, scanning electron microscopy and the wafer bow. Furthermore, the film resistivity and the temperature coefficient of resistance are measured by the van der Pauw technique starting from room temperature up to 300 °C. Independent of the investigated physical quantity, a dominant dependence on the sputtering gas nitrogen content is observed compared to other deposition parameters such as the plasma power or the sputtering gas pressure in the deposition chamber.

Influence of Deposition Parameters on Mechanical Stress and Magnetic Properties in Thick, Electroplated Co-Fe Flux Guides

A notable advantage of electroplated binary Co-Fe alloys in MEMS applications like sensors and actuators is the high saturation flux density BS, which may reach values of 2.4 T in a composition range of 50 – 70 wt% Fe. In contrast, there are certain disadvantages limiting the use of these alloys, e. g. high film stress, high corrosion sensitivity and high magnetostriction. The mechanical and magnetic properties of Co-Fe films influence each other strongly. They are determined by the films’ microstructure, given by film texture, grain size and morphology, structural defects and impurities. In this study, the effect of process conditions like current density, pulse duration, duty cycle, pH-value of the plating bath and application of a constant magnetic field parallel to the electrode surface on film stress, microstructure and magnetic properties are examined.

Improvement of the tribological performance in corrosive environment of CoCr alloy by TiSiON coatings

TiSiON thin films for load bearing applications were prepared by reactive cathodic arc evaporation at different substrate bias voltages. The influence of deposition parameters on the tribological performance of coated CoCr samples was investigated. The tribological performance of uncoated and coated CoCr alloy surfaces was investigated in 0.9% NaCl solution. The friction coefficient of the TiSiON in corrosive environment exhibited values ranging from 0.1 to 0.3. Combined adhesive and oxidative wear mechanism was found. All of the coatings demonstrated a better tribological performance when compared with uncoated CoCr substrate. Of the investigated coatings, TiSiON deposited at −200V bias voltages exhibited the best tribological performance in 0.9% NaCl, both in friction coefficient (0.1) and wear rate (6.29×10−6mm3/Nm).

Influence of Deposition Parameters on Structure of TDCs Deposited by PS-PVD Method

The paper presents an advanced technology of Thermal Barrier Coatings (TBCs) deposition called Plasma Spray – Physical Vapor Deposition (PS-PVD). The PS-PVD is a low pressure plasma spray technology to deposit coatings out of vapor phase, which enables obtaining of columnar ceramic coatings. In this paper, the influence of various gas mixtures on properties of deposited coatings has been investigated. The measurement of coating thickness was conducted by a light microscopy method, followed by a statistical analysis. All processes had been conducted at a very low feed rate, which additionally affected ceramic microstructure.

Influence of deposition parameters on structural, morphological and optical properties of ZnO films using robust design approach

This paper investigates the influence of deposition parameters on the crystallite size, roughness and transmittance of zinc oxide thin films by sol-gel technique using L9 orthogonal array. The thin films were deposited on the quartz substrate and the coating parameters were investigated for the influence of sucrose fuel, spinning speed, spinning duration and calcination temperature. Crystallite size was influenced by sucrose by 54.34%. Calcination temperature influenced roughness and transmittance by 57.49% and 68.56% respectively. The process yielded thin films with surface roughness of 131.45 nm, crystallite size of 12.78 and transmittance of 82.58% for the treatment sucrose 0.6 gram, spinning speed of 3,000 rpm, spinning duration of 30 seconds and calcination temperature of 900°C.

The influence of deposition parameters on the structure and properties of aluminum nitride coatings deposited by high power impulse magnetron sputtering

In this work, aluminum nitride (AlN) thin films were fabricated using the high power impulse magnetron sputtering (HIPIMS) process through the Taguchi method to determine the optimum deposition condition. A L9 array, signal-to-noise (S/N) ratio, and analysis of variance (ANOVA) were applied to study the deposition parameters (pulse frequency, duty cycle, temperature, and substrate bias) with consideration of the microstructure, hardness and transmittance properties of AlN coatings. The wurtzite hexagonal AlN structure was achieved for each coating. Typical fine and dense columnar structure was observed for AlN coating. Based on the higher the better concept using S/N ratio and the contribution using ANOVA, the substrate bias was the most influential parameter for the hardness of AlN coating. On the other hand, the duty cycle was important proportionally for the transmittance of AlN coatings. Confirmation tests with optimal deposition parameters were performed to verify the effectiveness of the Taguchi optimization analysis in this work. The maximum hardness of 25GPa and transmittance of 83.4% were achieved, respectively, for the AlN coatings deposited with optimal deposition parameters.

Influence of deposition parameters on the structural and optical properties of CdS thin films obtained by micro-controlled SILAR deposition

Polycrystalline CdS films were obtained by a micro-controlled SILAR deposition technique, using aqueous solutions of cadmium acetate and thiourea as precursors. The structural and optical properties of the films were found to be influenced by various deposition parameters such as number of immersion cycles, concentration of the precursors and temperature of the solutions. Contrary to the observations made by some researchers, we found that the thickness of the films increased continuously with number of immersion cycles and also with concentration of the precursor solutions. We also found that the films covered the substrates uniformly, without any voids, unlike the films obtained by others. Effect of deposition parameters on thickness, substrate coverage, grain size, chemical composition, optical band gap and other properties of the films is discussed in detail.

Microstructure and magnetic properties of NiZn nanowires with controlled Zn ion concentration and off-time between pulses

Varying the off-time between pulses in electrolyte with different compositions, NixZn1−x (0.73⩽x⩽0.91) nanowire arrays were ac pulse electrodeposited into the porous alumina templates prepared by common two-step anodization technique. The effect of post annealing also was investigated. The influence of deposition parameters on alloy contents was investigated by studying the microstructures and magnetic properties of as-prepared and annealed nanowires. Although Zn content was almost constant with increase in off-time between pulses it remarkably varied the magnetic properties of the samples. X-ray diffractometry of NiZn nanowires showed a face center cubic structure of Ni with a full with half maximum wider than usual Ni nanowires which was shifted towards the low angle confirming Zn substitution in the Ni lattice. Low Zn containing alloy nanowires showed relatively weak interacting single domain system while a pseudo-single domain system was seen for the annealed sample indicating larger magnetic domains with more interaction. Annealed samples with higher Zn content on the other hand showed a multi-domain treatment.

Experimental design in the degradation of pyrene by marine-derived fungi Chaunopycnis alba CBMAI 1346 and Xylaria sp. CBMAI 1464

Varying the off-time between pulses in electrolyte with different compositions, NixZn1−x (0.73 ⩽ x ⩽ 0.91) nanowire arrays were ac pulse electrodeposited into the porous alumina templates prepared by common two-step anodization technique. The effect of post annealing also was investigated. The influence of deposition parameters on alloy contents was investigated by studying the microstructures and magnetic properties of as-prepared and annealed nanowires. Although Zn content was almost constant with increase in off-time between pulses it remarkably varied the magnetic properties of the samples. X-ray diffractometry of NiZn nanowires showed a face center cubic structure of Ni with a full with half maximum wider than usual Ni nanowires which was shifted towards the low angle confirming Zn substitution in the Ni lattice. Low Zn containing alloy nanowires showed relatively weak interacting single domain system while a pseudo-single domain system was seen for the annealed sample indicating larger magnetic domains with more interaction. Annealed samples with higher Zn content on the other hand showed a multi-domain treatment.