The high rate sputtering process for the deposition of thin films can be used economically in in-line production plants for various applications with high reliability and process controllability. The deposition of hard TiN films onto tools can be achieved using high rate sputtering techniques. The coating process parameters must be optimized to meet special requirements of the film condensation conditions. Therefore, influences of the process parameters on the substrate temperature, the film structure, the stoichiometry, the thickness uniformity and the hardness were investigated and will be reported. The technical realization is described as a reactive bias sputtering process in a double-cathode arrangement of a given geometry with an essential bias power load to the substrates. The principles of a high throughput production plant with typical cycle times of approximately 60 min will be demostrated.