Application examples of imaging type photoelectron spectromicroscopy studies are introduced. One of the imaging type photoelectron spectromicroscopies is micro-ESCA or micro-XPS (electron spectroscopy for chemical analysis; X-ray photoelectron spectroscopy). We connected the modified commercial system (Fisons Instruments, ESCALAB 220i-XL) to the beamlines, which cover the photon energy range of 10 eV–5 keV at the UVSOR facility, Institute for Molecular Science, Okazaki, Japan. It is expected that spatial resolution of 2 μm for the imaging mode and 20 μm for the spectroscopic mode can be achieved. In conjunction with monochromatic and polarized synchrotron radiation light from the UVSOR storage ring, photoelectron spectroscopy studies have been performed, not only for surface science but also for spectroscopy of small samples. Another imaging type of photoelectron spectromicroscopy is known as photoelectron emission microscopy (PEEM). Now commercial PEEM is available with relatively high performance. We report here the example of the combination study of PEEM and X-ray magnetic dichroism spectroscopy for magnetic domain imaging performed at the Photon Factory, KEK, Tsukuba, Japan. Imaging with spatial resolution less than ∼200 nm is now possible using the synchrotron radiation. According to the demands from industrial usage, such as production of magnetic recording media etc., the application method becomes more important. These types of microscope techniques are very valuable, especially in the high brilliant synchrotron light source facility. The future prospects of photoelectron spectromicroscopy are described.