Recently there has been growth of interest in the fabrication of photodiodes in CMT, for use in electronically scanned hybrid focal plane arrays. Most devices are currently fabricated using a p-type wafer with an n-type surface layer introduced either by ion implantation or diffusion. In both types of junction the &,A product is dependent on the net doping concentration of the p-type substrate. In ion-implanted junctions for example the performance can be limited even at zero bias by the junction tunnelling current if the substrate doping is too high. It has been determined that a carrier concentration of 1 x 1Ol6 cme3 or less is required to produce implanted detectors with high zero bias resistance-junction area, R,,A, products. (l) Consequently an accurate, and rapid, method of determining the carrier concentration of p-type CMT is required. A common method of determining the net carrier concentrations in routine characterisation of semiconductors is to measure the Hall coefficient, RH, at a single temperature in the exhaustion range of the extrinsic conduction region. This method, using a spot measurement at 77K, has been found to be satisfactory for n-type CMT in which carrier freeze-out is not observed. However, p-type CMT is much more difficult to characterise by Hall effect measurements because of the high electron-to-hole mobility ratio, b, (500 at 80K) and a relatively high intrinsic carrier density in this narrow gap semiconductor. As a result the mixed conduction region in lightly doped p-type samples extends below 80K and may overlap the freeze-out region so that no exhaustion region is observed. Determination of the net doping concentrations in p-type material has therefore required the interpretation of Hall data obtained over a range of temperatures extending down to about 20K. The interpretation may be further complicated since oxidation of the surface of the samples can lead to an n-type skin which shunts the sample at low temperatures and in extreme cases can cause a p-type sample to appear in n-type. To overcome these difficulties the possibility of using a measurement of bulk conductivity to characterise the hole concentration has been investigated. The two band expressions for conductivity, 0, and low field Hall coefficient, RH are:
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