In this study, electrical steel laminated composites with positive Si gradient (PO-G), counter Si gradient (CO-G), and cross Si gradient (CR-G) were fabricated by hot-press sintering, cold rolling and annealing. The microstructure evolution during processing, as well as the magnetic and mechanical properties were investigated. The results indicate that the microstructure of the high-silicon layer and medium-silicon layer in the hot-pressed composites featured columnar grains throughout the thickness. The microstructure of the low-silicon layer in the hot-pressed CO-G sample consisted of equiaxed grains. However, a mixed structure dominated by columnar grains with some equiaxed grains was observed in the inner low-silicon layer of the PO-G and CR-G samples. Following cold rolling, the thickness ratio of each layer remained largely unchanged. After annealing, the microstructure of each layer transformed into columnar grains. The average grain size of the high-silicon layer, medium-silicon layer, and low-silicon layers in the three composites were approximately 20–23 μm, 33–38 μm, and 42–49 μm, respectively. Compared with the CO-G and CR-G samples, the annealed PO-G composite exhibited lower core loss at 400–1000 Hz and superior tensile strength. Furthermore, the core loss of the three composites was greater than that of the initial medium-silicon and high-silicon materials. This can be attributed to the increased hysteresis loss due to the existence of multi-layer interface.
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