An isotopically enriched C13 homoepitaxial diamond layer of 6±1μm thickness was grown on top of a brilliant cut diamond anvil by a microwave plasma chemical vapor deposition process for application as a pressure sensor. This isotopically enriched diamond tip was then used in conjunction with a natural isotopic abundance diamond anvil to generate high pressure on the sample. We provide a calibration for the C13 Raman mode of this extremely thin epitaxial layer to 156GPa using ruby fluorescence and the equation of state of copper as secondary pressure standards. The nonlinear calibration of the C13 Raman mode pressure sensor is compared with similar calibrations of C12 Raman edge and a good agreement is obtained. The Raman signal from the C13 epitaxial layer remained a distinct singlet to 156GPa, and pressure calibration is independent of sample mechanical strength or the diamond anvil geometry. The use of even thinner layer would allow calibration further into ultrahigh pressure regime where the use of other optical sensors has proven to be difficult.