Interference Lithography Research Articles

Top‐Down Fabrication of Ordered Nanophotonic Structures for Biomedical Applications

AbstractThe size, distribution, and specific shape of ordered nanophotonic structures are crucial for their biomedical applications. Bottom‐up approaches such as self‐assembly, emulsification, and precipitation are commonly fabricated nanophotonic structures, which often lack control of nanophotonic structures morphologies and monodispersed sizes. On the contrary, top‐down nanofabrication techniques offer the advantages of high fidelity and high controllability and are employed in the fabrication of nanophotonic structures. This review focuses on top‐down nanofabrication techniques to fabricate ordered nanophotonic structures and their biomedical applications. Several top‐down approaches used in the semiconductor industry and other fields requiring micro‐ and nanopatterns are used, including electron beam lithography/ion beam lithography, photolithography, interference lithography, nanoimprint lithography, nanosphere lithography, nanotransfer lithography, and nano‐electrodeposition. Various current and emerging biomedical applications of the ordered nanophotonic structures are also covered: i) surface‐enhanced Raman scattering, ii) plasmonics, including surface plasmon resonance and localized surface plasmon resonance, and iii) fluorescence enhancement. Finally, a future perspective of nanophotonic structures fabricated by top‐down techniques in biomedical applications is also summarized.

High diffraction efficiency varied-line-space concave gratings for the Lyman ultraviolet explorer

In this paper we present the design and fabrication of the reflection varied-line-space concave grating (VLSCG) for the project of CAFE (the Census of warm-hot intergalactic medium, Accretion, and Feedback Explorer), which aims to detect and map the warm-hot circumgalactic medium via OVI emission at 103.2 nm and 103.8 nm, using two off-Rowland-circle spectrograph channels. High diffraction efficiency at LUV is supposed for the VLSCG, and an aperture ratio as small as is desired for a compact design. The gratings are fabricated by holographic lithography and ion beam etching techniques. We introduce an additional lens into the normal holographic exposing system to generate the varied-line-space grating patterns. Grooves with triangle profiles are obtained to increase the diffraction efficiency by oblique ion beam bombardment during the etching process. Finally, several VLSCGs with a central line density of 3300 lines/mm have been fabricated successfully. The measured results show that the groove efficiency reaches 51% at 106.4 nm and 31% at 127.4 nm. We imitated the working optical path of the spectrometer and used the order of the VLSCG to measure the image near the exit slit. The results showed that the image of the point source has a vertical extent of 0.68 mm, and the aberrations have been corrected.

Complex Fourier Surfaces by Superposition of Multiple Gratings on Azobenzene Thin Films

AbstractDiffractive optical elements (DOE) are integral components for lightweight and ultra‐thin optical elements due to their ability to manipulate light efficiently and accurately. However, conventional DOEs are static and cannot be altered after fabrication, which hinders their adaptability to changing requirements. To overcome this limitation, the potential of surface patterning on azobenzene thin films to fabricate reconfigurable DOEs is investigated. Using holographic lithography, surface topographies with sinusoidal surface relief gratings (SRG) are created and the superposition of up to 80 SRGs with high accuracy and minimal information loss in subsequent inscriptions is demonstrated. This is enabled by a surface patterning tool combining holographic lithography and digital holographic microscopy. Reconfigurable and adaptive optical elements can improve the efficiency of optical coupling and increase the sensitivity and selectivity of sensors, especially in applications such as near‐eye displays and plasmonic sensors. These results demonstrate the ability to create complex azobenzene‐based DOEs for advanced photonic applications, where the ability to alter optical elements is of high importance.

Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings

The characterization of scanning tip morphology is crucial for accurate linewidth measurements. Conventional rectangular characterizers are affected by lateral distortion caused by the nonlinearities in AFM scanning, leading to errors between the actual characterization results and the true values. In this study, we innovatively developed self-traceable two-dimensional nano-gratings using chromium atomic deposition technology and extreme ultraviolet interference lithography. We used this structure as a characterizer for conducting scanning tip characterizations.This paper analyzed the periodic stability of the grating sample during scanning and corrected the lateral distortion of atomic force microscopy (AFM) at scan scales of 0.5 µm and 1 µm based on its self-traceable characteristics. Additionally, we extracted the angle information of the scanning tip in the X direction and Y direction within a scan scale of 0.5 µm. The results demonstrate that the two-dimensional grating sample exhibited excellent periodic stability during scanning. The characterization errors for the tip’s X direction and Y direction angles are within ±2°, showing high consistency. This study highlights that self-traceable two-dimensional grating samples have the capability for in situ bidirectional characterization of tip information, providing a creative solution for the development of new-style tip characterizers.

Optical interference phase control method with single photodetector for interference lithography.

This study designs an optical phase control method for interference lithography system accompanied with severe disturbance. The system, which is designed based on the exponential reaching law of sliding mode control(SMCE), could adjust the interference phase with single photodetector. The model of system is derived and then the stability is proved through Lyapunov theorem. This paper also analyzes the behavior of the system under different reference voltages of photodetector. Both theoretical analysis and simulation experiment results suggest that this method can non-periodically achieve interference phase control with single photodetector by the switching module. Finally, the experimental device is set up, and the superiority of the SMCE method in transient response time and disturbance-resisting ability is demonstrated compared with the proportional-integral-derivative(PID) method.

Performance of Grating Couplers Used in the Optical Switch Configuration.

Surface plasmon resonance is an effect widely used for biosensing. Biosensors based on this effect operate in different configurations, including the use of diffraction gratings as couplers. Gratings are highly tunable and are easy to integrate into a fluidic system due to their planar configuration. We discuss the optimization of plasmonic grating couplers for use in a specific sensor configuration based on the optical switch. These gratings present a sinusoidal profile with a high depth/period ratio. Their interaction with a p-polarized light beam results in two significant diffracted orders (the 0th and the -1st), which enable differential measurements cancelling noise due to common fluctuations. The gratings are fabricated by combining laser interference lithography with nanoimprinting in a process that is aligned with the challenges of low-cost mass production. The effects of different grating parameters such as the period, depth and profile are theoretically and experimentally investigated.

Crossed grating sensing refractive index change in the non-laboratory environment.

Surface plasmon polaritons (SPPs) have been widely applied to refractive index (RI) sensing for their extremely high sensitivity to the surrounding RI change. Many efforts have been devoted to narrowing the linewidth of the SPP mode and enhancing the sensitivity of SPP sensors. However, most reported SPP-based RI sensing platforms could only operate in a laboratory environment for their bulky volume or sophisticated measuring systems. In this context, we have developed a miniaturized and portable RI sensing platform based on a 2D crossed grating coupled SPP sensor that can work under a non-laboratory environment. The crossed grating is fabricated by the laser interference lithography (LIL) method, which is cost-effective and reproductive. A series of glucose solutions with different concentrations have been used as analytes to verify the sensing performance of the fabricated crossed grating.

Study on Two-Dimensional Exit Pupil Expansion for Diffractive Waveguide Based on Holographic Volume Grating

Diffraction gratings are becoming a preferred option for waveguide head-mounted in–out coupling devices due to their flexible optical properties and small size and light weight. At present, diffraction waveguide coupling devices for AR head-mounted displays (HMD) have difficulties such as a long development cycle and complicated processing. In this paper, we first establish a set of two-dimensional (2D) grating ray tracing models, based on which we determine the initial architecture of the dual-region two-dimensional exit pupil expansion (2D-EPE) AR-HMD holographic waveguide diffraction system. Second, we propose a honeycomb coupled grating array and optimize the optical energy utilization and brightness uniformity of the holographic waveguide and use a custom dynamic linked library (DLL) function to implement the ray tracing of the 2D grating and add a probabilistic splitting function to the DLL, which reduces the single simulation time from 11.853 min to 1.77 min. We also propose a holographic lithography device composed of holographic optical elements (HOEs) and a method for preparing HOEs. Finally, in order to obtain the diffraction efficiency preoptimized by the above DLL for the uniformity of the exit pupil brightness and light energy utilization, we inverse design with the preparation process parameters as the optimization variables and develop the adaptable electromagnetic calculation program Holo-RCWA. Using Holo-RCWA with nondominated sorting genetic algorithm II (NSGA-II), we inverse design to obtain the process parameters satisfying the diffraction efficiency distribution, and the optimization time of the whole system is reduced from 2–3 days to 10 h. This work is of great significance for AR/VR applications.

Real-Time Imaging of Plasmonic Concentric Circular Gratings Fabricated by Lens-Axicon Laser Interference Lithography.

Concentric circular gratings are diffractive optical elements useful for polarization-independent applications in photonics and plasmonics. They are usually fabricated using a low-throughput and expensive electron beam lithography technique. In this paper, concentric circular gratings with selectable pitch values were successfully manufactured on thin films of azobenzene molecular glass using a novel laser interference lithography technique utilizing Bessel beams generated by a combined lens-axicon configuration. This innovative approach offers enhanced scalability and a simplified manufacturing process on larger surface areas compared to the previously reported techniques. Furthermore, the plasmonic characteristics of these concentric circular gratings were investigated using conventional spectrometric techniques after transferring the nanostructured patterns from azobenzene to transparent gold/epoxy thin films. In addition, the real-time imaging of surface plasmon resonance colors transmitted from the concentric circular gratings was obtained using a 45-megapixel digital camera. The results demonstrated a strong correlation between the real-time photographic technique and the spectroscopy measurements, validating the efficacy and accuracy of this approach for the colorimetric studying of surface plasmon resonance responses in thin film photonics.

Two-dimensional sub-200 nm pitch Si gratings with natural orthogonality

As a standard for length and angle, two-dimensional (2D) grating reference materials can be used for performance verification and calibration of various microscopes and 2D stages. This paper proposes a 2D nanoscale reference grating manufactured by combining laser-focused atomic deposition (LFAD) and extreme ultraviolet interference lithography. The theoretical pitch of the 2D grating is 150.46 nm, which is only times the pitch of the Cr grating manufactured by LFAD which can be traceable to the resonance transition frequency of Cr. Moreover, the angle between two periodic directions of the 2D nanograting has natural orthogonality.

Development of EUV interference lithography for 25 nm line/space patterns

In this study, we present the performance of an extreme ultraviolet interference lithography (EUV-IL) setup that was reconstructed at Taiwan Light Source 21B2 EUV beamline in the National Synchrotron Radiation Research Center (NSRRC), Taiwan. An easy-to-perform fabrication method to produce a high-quality transmission grating mask and a simple design of experimental setup for EUV-IL were developed. The current EUV-IL setup is capable of fabricating line/space patterns down to 25 nm half-pitch in hydrogen silsesquioxane (HSQ) resist. Preliminary exposure results revealed that optimized slit width and exposure time significantly improved line/space pattern quality. The current EUV-IL tool at NSRRC can be used for nano-patterning and resist screening to advance the next generation of semiconductor devices.

(Invited) integration of Microneedles and Electrochemical Sensors for Medical Applications

Microneedles are small-scale devices that may be used for access to interstitial fluid and/or capillary blood for transdermal monitoring of chemicals [1]. In this presentation, the integration of several types of electrochemical sensors with hollow microneedles will be considered. For example, carbon fiber electrodes have been integrated with digital micromirror device-produced microneedles; ascorbic acid and hydrogen peroxide were detected with these devices [2]. Carbon paste electrodes have also been integrated with digital micromirror device-produced microneedles; electrodes made from rhodium-dispersed carbon paste were used for hydrogen peroxide sensing [3]. In addition, lactate oxidase-modified rhodium-dispersed carbon paste electrodes were demonstrated for lactate sensing, including in the presence of interferents such as ascorbic acid, uric acid, and acetaminophen. A multiplexed microneedle array containing digital micromirror device-produced microneedles was subsequently used for amperometric detection of glucose, lactate, and pH; detection of these analytes in complex media was shown [4]. More recently, digital micromirror device-produced hollow microneedles were modified with a working sensor, which was prepared with graphene ink and 4 (3-Butyl-1-imidazolio)-1-butanesulfonate) ionic liquid. Direct oxidation of fentanyl via square-wave voltammetry was shown; a detection limit of 27.8 μM was demonstrated using this approach [5]. Two photon polymerization has also been used to create hollow microneedles for biosensing; a porous carbon electrode created using interference lithography was used for potassium ion sensing in the presence of interfering sodium ions [6]. In another study, nitrogen-incorporated ultrananocrystalline diamond coatings were deposited on Ti –6Al–4V alloy microneedles using microwave plasma enhanced chemical vapor deposition; dopamine and uric acid were electrochemically detected in an in vitro study [7]. These studies indicate that microneedles may have utility for minimally invasive detection of analytes in a real time manner. Benefits and disadvantages of the microneedle-based sensing approach as well as efforts needed for clinical translation of microneedle-based sensing technology will be considered.

Phase Mask Pinholes as Spatial Filters for Laser Interference Lithography

Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian‐shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography‐defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et al., a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, the first successful fabrication of such elements is reported on and their use in an LIL setup is demonstrated to reduce feature dimension variations in fabricated devices.

Multiple-beam colloidal quantum dot lasers in a waveguide-grating-waveguide microcavity

In this work, multiple-beam colloidal quantum dot lasers are achieved in a double waveguide-grating (waveguide-grating-waveguide, W-G-W) microcavity. The grating is fabricated simply using interference lithography, and CdSe/CdS/ZnS colloidal quantum dots (CQDs) are spin-coated as the gain to form an active waveguide-grating structure. The photoresist film, which is not completely etched to the bottom, provides another waveguide-grating structure. In the W-G-W structure, low-threshold multiple-beam laser output is realized under optical pumping with emission peaks at 664.6 and 645.2 nm. The oblique laser is derived from a quasi-propagation mode. The thresholds of the two laser modes are 22.7 and 28.3 μJ/cm2, respectively, and both laser modes are TE0 modes. In addition, the emission wavelengths of the two modes of the designed distributed feedback laser can be flexibly tuned by changing the thickness of the CQDs' waveguide layer. The presence of quasi-propagation modes provides another method for designing compact laser sources, which could help in the design of wireless communication networks, hyperspectral 3D sensing, and color laser displays.

Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system.

To improve the exposure contrast of the scanning beam interference lithography (SBIL) system, a mathematical model of scanning exposure that includes the direction error of the measurement mirror is established. The effect of the angle between the interference fringe direction and the X-axis measurement mirror direction on the exposure contrast is analyzed. An accurate method for interference fringe direction measurement based on the heterodyne interferometry measurement method of the metrology grating and phase shift interferometry is proposed. This method combines the diffraction characteristics of the metrology grating and the phase shift algorithm to calculate the angle between the interference fringe direction and the measurement mirror direction accurately and adjust it. Experiments show that this angle reaches 0.6777 µrad, which meets high-precision grating fabrication requirements. Exposure comparison experiments performed at various angles show that a smaller angle between the interference fringe direction and the measurement mirror direction leads to better grating groove production by scanning exposure, which is consistent with the theoretical analysis. The accuracy of the theoretical analysis and the feasibility of the interference fringe direction adjustment method are verified, laying a foundation for high-quality grating fabrication by the SBIL system.

Angle-resolved and time-resolved spectroscopic study on large-area silver gratings fabricated via optical interference lithography

Plasmonic resonators, which can enhance the near-field due to plasmon excitation, have attracted extensive research interest due to their significant potential in photodetection, photocatalysis, photovoltaics, and other applications. Here, we experimentally present spectroscopic results of plasmonic resonances on large-area nanoscale silver (Ag) gratings, fabricated by optical interference lithography based on angle-resolved optical absorption spectroscopy and femtosecond transient absorption spectroscopy (TAS). Specifically, we have measured plasmon resonances as a function of azimuthal angles and detection angles under p- and s-polarization. TAS reveals the non-radiative decay of plasmon resonances by transferring energy to nearby species, including exciting plasmonic hot electrons, which can be harvested by coupled semiconductors through a metal-semiconductor Schottky barrier. Our numerical simulation provides insight into the near-field analysis and quantifies the density of plasmonic hot electrons excited in our Ag-gratings.

Fabrication of periodic hierarchical structures with anti-icing performance by direct laser interference lithography and hydrothermal treatment

Ice accumulation could result in a massive economic burden as well as major life safety issues. Because of their immense potential to ease icing problems, superhydrophobic structures have captured the curiosity of many researchers. Herein, the periodic hierarchical porous structures that have outstanding anti-icing performance were created using two-beam direct laser interference lithography and hydrothermal treatment. The periodic hierarchical porous structures were composed of periodic micro ridge arrays covered with interlaced grown standing nanoflakes. The high-water repellency of the periodic hierarchical porous structures was characterized by the high contact angle and the low rolling angle of 163.7° ± 1.5° and 3.4° ± 0.8°, respectively. The high-water repellency of the periodic hierarchical porous structures exhibits a long-term stability in air and durability in contact with water. The experimental results indicated that the anti-icing performance of the periodic hierarchical porous structures was achieved through the long-term inhibition of ice nucleation and low ice adhesion strength. The ice nucleation inhibition time could reach up to 378 s, which was more than 11.8 times longer than the untreated surface. The ice adhesion strength could be reduced to 48.3 kPa, which was more than 6.3 times lower than the untreated surface. The proposed manufacturing strategy and designed structures could be useful for designing anti-icing structures.

Present Status of EUV Interference Lithography at NewSUBARU

Present Status of EUV Interference Lithography at NewSUBARU

Directional light output enhancement of scintillators by mixed-scale microstructures based on soft-X-ray interference lithography and self-assembly

In this paper, we have successfully demonstrated that the directional control of the light output of the scintillator can be achieved by mixed-scale microstructures which integrate photonic crystals on the wavelength scale and microlens arrays on the micrometer scale. Compared to the reference sample, the mixed-scale microstructures can enhance the light output of the scintillator by 3.07-fold at the emergence angle of 35°. This enhancement in the light output exhibits both azimuthal angle and wavelength dependence. Our hybrid simulation and experimental characterization explain the physical mechanism behind the enhanced directional light output. This method holds potential for application in radiation detection systems and other light-emitting devices requiring directional light output.

Laser Interference Lithography—A Method for the Fabrication of Controlled Periodic Structures

A microstructure determines macro functionality. A controlled periodic structure gives the surface specific functions such as controlled structural color, wettability, anti-icing/frosting, friction reduction, and hardness enhancement. Currently, there are a variety of controllable periodic structures that can be produced. Laser interference lithography (LIL) is a technique that allows for the simple, flexible, and rapid fabrication of high-resolution periodic structures over large areas without the use of masks. Different interference conditions can produce a wide range of light fields. When an LIL system is used to expose the substrate, a variety of periodic textured structures, such as periodic nanoparticles, dot arrays, hole arrays, and stripes, can be produced. The LIL technique can be used not only on flat substrates, but also on curved or partially curved substrates, taking advantage of the large depth of focus. This paper reviews the principles of LIL and discusses how the parameters, such as spatial angle, angle of incidence, wavelength, and polarization state, affect the interference light field. Applications of LIL for functional surface fabrication, such as anti-reflection, controlled structural color, surface-enhanced Raman scattering (SERS), friction reduction, superhydrophobicity, and biocellular modulation, are also presented. Finally, we present some of the challenges and problems in LIL and its applications.