A new CuNi/TiB2 thin-film thermocouple was fabricated using magnetron sputtering. A 400 nm thick CuNi interior layer was deposited on a dielectric substrate initiatory, and then covered by an 800 nm thick TiB2 layer. The tests revealed that the TiB2 layer had a dense and columnar cross-section. The measured hardness and elastic modulus of the TiB2 layer were ~20.5 and 315.9 GPa, respectively. No cracking or delamination occurred at the CuNi/TiB2 interface. The work functions of the TiB2 and the CuNi layers were calculated to be 4.406 and 4.726 eV, respectively. The difference in work functions between the TiB2 and the CuNi was ~0.3 eV. The CuNi/TiB2 thin-film sensor exhibited a high Seebeck coefficient of 38.07 μV/°C with excellent linearity. The maximum service temperature of the thin-film sensor was evaluated to be ~400 °C. A further increase in temperature degraded the Seebeck coefficient due to oxidation of the TiB2 layer.
Read full abstract