We present a novel technology for transferring glassy carbon microstructures, originally fabricated on a silicon wafer through a high-temperature process, to a polymeric flexible substrate such as polyimide. This new transfer technique addresses a major barrier in Carbon-MEMS technology whose widespread use so has been hampered by the high-temperature pyrolysis process (⩾900 °C), which limits selection of substrates. In the new approach presented, patterning and pyrolysis of polymer precursor on silicon substrate is carried out first, followed by coating with a polymer layer that forms a hydrogen bond with glassy carbon and then releasing the ensuing glassy carbon structure; hence, transferring it to a flexible substrate. This enables the fabrication of a unique set of glassy carbon microstructures critical in applications that demand substrates that conform to the shape of the stimulated/actuated or sensed surface. Our findings based on Fourier transform infared spectroscopy on the complete electrode set demonstrate—for the first time—that carbonyl groups on polyimide substrate form a strong hydrogen bond with hydroxyl groups on glassy carbon resulting in carboxylic acid dimers (peaks at 2660 and 2585 cm−1). This strong bond is further confirmed by a tensile test that demonstrated an almost perfect bond between these materials that behave as an ideal composite material. Further, mechanical characterization shows that ultimate strain for such a structure is as high as 15% with yield stress of ~20 MPa. We propose that this novel technology not only offers a compelling case for the widespread use of carbon-MEMS, but also helps move the field in new and exciting directions.