In scanning beam microfabrication processes, including resist exposure, direct maskless ion implantation, and micromachining, ions and electrons have complementary roles. It is advantageous to have, within a single scanning beam machine, finely focused and precisely coregistered beams of both ions and electrons. The requirement for the ion beam and the electron beam to have a common axis and to be focused at the target by a high resolution lens with short working distance can be met both by solely electrostatic and by combined magnetic and electrostatic lenses. Such lenses, and complete probe‐forming systems incorporating them, are considered.