Transparent conductors are becoming of increasing importance because of increased interest in the interactions of light with electrically or electronically active materials, and for their high ir reflectivity which is useful for solar energy applications. The information in this presentation is largely organized by film deposition process rather than the film material because, ostensibly, the same material deposited by two different deposition techniques ordinarily yields two widely varying sets of physical properties. This is not surprising because of the complex physics and chemistry of the materials used for this purpose. Broadly speaking, there are two classes of materials: semiconducting oxides and very thin metals. The properties of the oxides depend critically upon their oxidation state and the nature and quantity of impurities trapped in the film. The properties of the thin metals depend upon nucleation and early coalescence phenomena and impurities. Both the electrical and optical properties of both classes depend strongly on the nature of the substrate used (impurities that can diffuse from the substrate into the film and the refractive index of the substrate). Following a brief review of the physics of conductivity and transparency in these materials, detailed analysis of the following film deposition processes are given: hydrolysis of chlorides, pyrolysis, evaporation and sputtering of thin metals (with and without nucleation modifying layers), reactive evaporation and sputtering, and sputtering of oxide targets. The important process-control parameters that affect the electrical and optical properties of transparent conducting films are discussed.
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