Combined arc/unbalanced magnetron (ABS™) PVD hard coating technology has been available to the hard coating market for five years with the industrial coating system HTC-1000-ABS-MK I. Besides an improved HTC-1000-ABS-MK II version the HTC-1500-ABS is available now, with a four-fold production capacity of that of the original model.In the HTC-1500-ABS six cathode positions are integrated into the two large doors of the typically octagon-shaped vacuum chamber. The positions can be used to mount either Arc or UBM cathodes as needed for the type of coating that will be deposited. The length of the cathodes is 1700mm and individual shutters minimize cross contamination in the multitarget unit. In UBM mode, the degree of ionisation is controlled by electromagnets. Four 22001/s turbo molecular pumps in combination with a 1000 m3/h roots and a 250 m3/h rotary vane pump guarantee sufficient high gas throughput and short pumping periods. Reactive gas control can be carried out by high accuracy Viscovac total pressure control. A constant process temperature is achieved by powerful radiative heaters. Substrate fixturing is carried out using roll-in/roll-out, two-or three-fold rotating turntables. The diameter of the substrate turntable is 900 mm with an effective coating height of 1500 mm. Principal applications are temperature coatings, including decorative and automotive applications. The unit is especially suited to further promote PVD as an environmentally friendly coating technology.