High-density Aluminum Research Articles

High Density Aluminum Etcher Process Window Characterization and Comparison

The process characteristics of four, high density, aluminum, plasma etchers using three types of plasma sources have been experimentally studied. Aluminum etch rate was found to depend mainly on process pressure, total flow rate, chamber volume, and chlorine flow rate. In addition, when etching with a BCl3/Cl2 chemistry, aluminum line profile appears to be comparable between plasma sources. Electrical breakdown on a IC capacitor, aluminum line critical dimensions, and aluminum and photoresist etch rate uniformities were found to differ between etcher types. Since etch rate uniformities and aluminum line critical dimensions appear to be determined by ion current flux, chamber design and process parameters, and similar ion current flux values and process parameters can be obtained with different plasma sources, it is suggested that the plasma source has limited affect on these characteristics. Only breakdown voltage appears to depend on the plasma source.

Soft-x-ray and x-ray ultraviolet radiation from high-density aluminum plasmas

Radiation emission over a wide range (5--5000 A) of wavelengths in a high-density aluminum plasma has been studied theoretically. The atomic model includes explicit treatment of a large number of states and transitions characterizing the line emission from the Al III--Al XIII ions. The state populations are calculated using a set of atomic rate equations describing a plasma in collisional-radiative equilibrium. The ionization state of the plasma is calculated self-consistently with line and continuum radiation transport using a one-dimensional multicell structure for the plasma. A new radiation transport scheme has been implemented in this model based on probability of escape for both line and continuum photons. The total L- and K-shell radiation emission is described as a function of plasma temperature, density, and source size, and is compared to predictions made from corona and local thermodynamic equilibrium models. It is shown that over a wide range of plasma parameters, neither of these two limiting models accurately describes the plasma emission characteristics. Several line intensity ratios from L-shell lines are studied and shown to be useful diagnostic indicators of the plasma temperature and density. Finally, theoretical spectra are calculated and discussed in the context of their comparability with experimental spectra inmore » order to make contact with real plasma radiation signatures and exploit the predictive capabilities of the model.« less

Method for manufacture of aluminium sheet and sintered high-density aluminium laminate by direct power rolling process : Suzuki, Y. (Agency of Industrial Science & Technology) US Patent 4 045 857 (6 September 1977)

Method for manufacture of aluminium sheet and sintered high-density aluminium laminate by direct power rolling process : Suzuki, Y. (Agency of Industrial Science & Technology) US Patent 4 045 857 (6 September 1977)

Technology and properties of high-density aluminum nitride materials

Technology and properties of high-density aluminum nitride materials