The article reports on structure and mechanical properties of TiB alloy films sputter deposited from a sintered TiB 2 target using an unbalanced dc magnetron. We present results of a systematic investigation of the effect of negative substrate bias, U s, substrate ion current density i s, and substrate temperature, T s, on properties of TiB films. The X-ray diffraction (XRD) analysis shows that the TiB films consist of the hexagonal TiB 2 phase with the typical (0001) texture only. The TiB x films are over-stoichiometric with the ratio x=B/Ti≈2.4. All TiB films sputter ion plated in argon magnetron discharge are superhard films with hardness H>40 GPa and exhibit high values of (i) effective Young's modulus E*= E/(1− ν 2) up to approximately 600 GPa and (ii) elastic recovery, W e, up to approximately 82%; here E and ν are the Young's modulus and the Poisson's ratio, respectively. Besides, it was found that the value of the Bragg's angle 2θ of the (0001) reflection line can be easily controlled by the energy delivered to the film during its growth by (1) the substrate heating T s and (2) ion bombardment ( U s, i s). The angle 2θ of the (0001) reflection increases with increasing T s from 300 to 550 °C and decreasing U s from −150 to −50 V. In this range of process parameters, the energy E p delivered to the growing film per condensing atom by ion bombardment can be adjusted to a value, at which the (0001) reflection from sputtered films is close to that of the TiB 2(0001) powder standard. These films exhibit a low macrostress, which approaches to zero. It enables to sputter thick (up to 8 μm) superhard (H>40 GPa) TiB films. The optimum value of E p is achieved when the TiB film is sputtered at U s=−50 V, i s=1 mA/cm 2, T s=550 °C with a deposition rate a D=52 nm/min. The TiB film prepared under these conditions exhibits a maximum hardness of H≈77 GPa, measured using a computer controlled microhardness tester Fischerscope H100 at the Vickers diamond indenter load L=50 mN.