TMDs (Transition-metal dichalcogenides) come out in contemporary years as a remarkable class of two-dimensional (2D) materials and have allured enormous consideration. In the class of TMD materials, Molybdenum disulfide (MoS 2 ) has unveiled encouraging applications in the domain of photonics, electronics, electrochemistry and energy. Specifically, the defects originated in MoS 2 play a significant role in modifying the magnetic, electronic, catalytic and optical peculiarities of MoS 2 , depicting an applicable way in modifying the efficiency of MoS 2 based devices. The course through which lattice defects influence the MoS 2 peculiarities are unresolved. In the present work, we present comprehensively how lattice defects impact the electronic structure of MoS 2. We have probed the prospect to employ swift heavy ion irradiation for nano-structuring of sputtered 2D MoS 2 thin films. Our extensive study of ion instigated structural, optical and morphological alterations in MoS 2 thin films manifests that resting on the parameters of irradiation profusion of defects can be established. Theoretically, the optical bandgap also has been determined using Density functional theory (DFT). We grow the thin films of MoS 2 by the sputtering method and induced the defect in MoS 2 thin films by ion irradiation. We evaluated how these defects impact the electronic structure of MoS 2 thin films by measurements taken from Raman, X-ray photoelectron spectroscopy (XPS), photoluminescence spectroscopy (PL), UV–visible spectroscopy, Atomic force microscopy (AFM), X-ray diffraction (XRD) and Rutherford backscattering spectroscopy (RBS).
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