This study mainly aims to evaluate the intermixing between layers during the deposition of dielectric/metal/dielectric nanoscale multilayer coatings. TiO2 and WO3 films as dielectric materials are developed using radio frequency reactive magnetron sputtering on unheated soda lime glass substrates. Ag films are grown using radio frequency argon sputtering. Auger electron spectroscopy and ultraviolet–visible–near infrared spectrometry are employed to estimate the degree of layer intermixing in TiO2/Ag, WO3/Ag, TiO2/Ag/TiO2 and WO3/Ag/WO3 films. The morphological properties are also investigated under a field emission scanning electron microscope and an atomic force microscope. The transmittance curves for bilayer films exhibited heat mirror effects significantly. However, multilayer films showed a little amount of heat mirror effects. Auger electron spectroscopy depth profiles confirmed a minor diffusion of Ag at the TiO2/Ag interface. However, significant interactions of WO3 with Ag were observed for the WO3/Ag film. Besides, severe intermixing and oxidation of Ag films were observed for the multilayer films.