We investigate substrate roughness-induced fluctuations on liquid films in the presence of polar (exponential) and apolar (van der Waals) interactions in the complete wetting regime. The liquid/vapor interface roughness amplitude ${\ensuremath{\sigma}}_{w}$ increases rapidly with film thickness \ensuremath{\varepsilon} above a critical thickness ${\ensuremath{\varepsilon}}_{c}$ for which the film is stable (or it does not rupture due to presence of polar interactions), and it reaches a maximum at a thickness ${\ensuremath{\varepsilon}}_{m}$ slightly larger than ${\ensuremath{\varepsilon}}_{c}$ if polar and apolar components are of comparable strength and for small polar potential ranges. As the strength of the polar interaction decreases with respect to the apolar, behavior characteristic of that of apolar interactions within the Derjaguin approximation is recovered for moderate film thicknesses $(\ensuremath{\varepsilon}>{\ensuremath{\varepsilon}}_{m});$ ${\ensuremath{\sigma}}_{w}\ensuremath{\propto}{\ensuremath{\zeta}}^{\ensuremath{-}2}$ with \ensuremath{\zeta} the healing length.