Growth Of Atom Clusters Research Articles

Effect of sandblasting on adhesion strength of diamond coatings

Premature failure of a diamond-coated tool often results from a poor adhesion of the coating and shortens the lifetime of the tool. This study presents the results of increasing the adhesion strength of diamond coatings on cutting tool inserts by pretreating the inserts with sandblasting technique to obtain a desirable surface morphology of the inserts. A geometric model representing the ideal surface morphology is established to enhance the nucleation density and adhesion strength of diamond coatings. Diamond coating experiment is conducted on the substrates of four different sample groups. Indentation and wear tests are performed on diamond-coated inserts to evaluate the effect of sandblasting on the adhesion strength of the coatings. A theoretical analysis is provided on the formation and growth of atom clusters in terms of the contact angle and the thermodynamic barrier of a substrate to predict diamond nucleation. The theoretical prediction has a good agreement with the experimental results obtained in this study and by Dennig and Stevenson [P.A. Dennig, D.A. Stevenson, Proceedings of the International Conference on New Diamond Science and Technology, 403 (1991); P.A. Dennig, D.A. Stevenson, Proceedings of the First International Conference on the Applications of Diamond Films and Related Materials, 383 (1991).].

Computer Simulation of Nucleation and Growth of Atom Clusters in Thin Films

A computer has been used to simulate nucleation and growth of metal atom clusters on a crystalline substrate. The computer model allows the adsorbed metal atoms to move on the surface under the influence of both their mutual interaction and their interaction with the atoms of the substrate, until they form a cluster of minimum energy. The Morse potential function has been used to describe the interaction between the adsorbed atoms. The interaction between the substrate and the adsorbed atoms is described by an adsorption potential and a superposed sinusoidal potential determined by the activation energy of diffusion. Computed results are compared with those obtained in evaporation experiments.