Grating Coupler Research Articles

Holographically fabricated out-of-plane blazed gratings and channel waveguides in silica for integrated free-space beam delivery.

Grating couplers are widely used in integrated optics to generate free-space beams and facilitate localized interactions with systems such as atom or ion traps. However, etched devices often exhibit small-scale inconsistencies; exacerbated by the high index contrast of the devices, this can lead to phase errors, limiting devices to a sub-millimeter scale. Here we present the first demonstration, to our knowledge, of tilted, out-of-plane blazed gratings in planar silica fabricated by UV inscription using a 213 nm laser. Our devices deliver collimated and focusing beams into free space from a waveguide input without the need for additional optics such as beam expanders.

High Coupling Efficiency Polarization Splitting Waveguide Grating Couplers

High Coupling Efficiency Polarization Splitting Waveguide Grating Couplers

Control resonant excitation of surface plasmon polariton in quantum-dot molecule system via tunneling induced transparency and Autler–Townes splitting

Electromagnetic induced transparency (EIT) and Autler–Townes splitting (ATS) both produce a transparency window in an absorption profile, yet EIT is distinct in that it can create a transparency window for a weak control field. To elucidate the distinct physical mechanisms underlying EIT and ATS effects, we explore the controlled resonant excitation of surface plasmon polaritons (SPPs) within these regimes. Our setup is composed of three layers: a top vacuum or air layer, a central metal film, and a bottom layer of dielectric medium based on the quantum-dot molecules (QDMs) system. Unlike typical systems, that employ prism or grating coupling scheme, our setup takes advantage of the unique features of the QDMs medium to investigate the direct resonance excitation of SPPs. A weak probe and a strong control field are carried through air or vacuum to the top layer. Our results demonstrate that the permittivity of the bottom medium displays tunneling induced transparency (TIT) if the tunneling strength (Te) and the decay rate of the direct exciton (Γ1) follow the condition Te/Γ1⩽0.5; otherwise, it represents the ATS effect. In both instances, the permittivity of the QDMs medium satisfy the low-loss (high transmission) criteria, i.e., Re [ɛd]<1 and Im [ɛd]≪1, providing a framework for exploring the control resonant excitation of SPPs. We simulate the reflection and transmission spectra using the Fresnel’s formula and noticed sharp dips in reflection and peaks in the transmission spectra, which are the signature of coupler free resonance excitation of SPPs. We noticed that the narrow peak in TIT allows for strong light transmission and thus a high peak in SPP resonance excitation, resulting in higher sensitivity in plasmonic sensors. Conversely, the large spacing between the two peaks in the ATS effect broadens the range of effective excitation frequencies for SPPs, increasing the system’s adaptability and efficiency in applications requiring broad spectrum responses.

Design and fabrication of a sub-3 dB grating coupler on an X-cut thin-film lithium niobate platform.

Thin-film lithium niobate (TFLN) based integrated photonic devices have been intensively investigated due to their promising properties, enabling various on-chip applications. Grating couplers (GCs) are wildly used for their flexibility and high alignment tolerance for fiber-to-chip coupling. However, achieving high coupling efficiency (CE) in TFLN GCs often requires the use of reflectors, hybrid materials, or extremely narrow linewidths of the grating arrays, which significantly increases the fabrication difficulty. Therefore, there is a demand for high-CE GCs on TFLN with simple structure and easy fabrication processes. In this paper, combining process capabilities, we demonstrate a highly efficient apodized GC by linearly optimizing the period length and the fill factor on a 600-nm-thick TFLN platform. Without any reflector or hybrid material, we achieve a remarkable coupling loss of -2.97 dB at 1555 nm on the 600-nm-thick X-cut TFLN platform with only a single lithography and etching step. Our work sets a new benchmark for CE among GCs on the 600-nm-thick TFLN platform.

On chip control and detection of complex SPP and waveguide modes based on plasmonic interconnect circuits

Abstract Optical interconnects, leveraging surface plasmon modes, are revolutionizing high-performance computing and AI, overcoming the limitations of electrical interconnects in speed, energy efficiency, and miniaturization. These nanoscale photonic circuits integrate on-chip light manipulation and signal conversion, marking significant advancements in optoelectronics and data processing efficiency. Here, we present a novel plasmonic interconnect circuit, by introducing refractive index matching layer, the device supports both pure SPP and different hybrid modes, allowing selective excitation and transmission based on light wavelength and polarization, followed by photocurrent conversion. We optimized the coupling gratings to fine-tune transmission modes around specific near-infrared wavelengths for effective electrical detection. Simulation results align with experimental data, confirming the device’s ability to detect complex optical modes. This advancement broadens the applications of plasmonic interconnects in high-speed, compact optoelectronic and sensor technologies, enabling more versatile nanoscale optical signal processing and transmission.

High-efficiency dual-level heterogenous grating coupler on CMOS-compatible silicon-lithium niobate platform

We present the design and experimental demonstration of multilayer etched CMOS-compatible grating couplers with high efficiency on a heterogeneous silicon-lithium niobate platform. The dual-level grating coupler comprises 90 nm-thick Si waveguides and 220 nm-thick Si grating with a linear chirped structure without etching LN. The design changes the grating diffraction properties, which not only reduce back reflection but also improve directionality and fiber-to-chip mode match. In comparison with existing studies, this work achieves high coupling efficiency solely through CMOS-compatible etching without additional bottom reflectors or high-index overlays. Theoretical calculations predict a fiber-to-chip coupling efficiency of −1.76 dB and an off-chip diffraction efficiency of −1.1 dB for the TE mode. The experimental measurement of the peak coupling efficiency is −2.84 dB with the back reflection as low as −26 dB. The grating coupler paves the way for monolithic integration of Si and LN.

AI-driven photonics: Unleashing the power of AI to disrupt the future of photonics

Recent advances in artificial intelligence (AI) and computing technologies are currently disrupting the modeling and design paradigms in photonics. In this work, we present our perspective on the utilization of current AI models for photonic device modeling and design. Initially, through the physics-informed neural networks (PINNs) framework, we embark on the task of modal analysis, offering a unique neural networks-based solver and utilizing it to predict propagating modes and their corresponding effective indices for slab waveguides. We compare our model’s predictions against theoretical benchmarks and a finite differences solver. Evidently, using 349 analysis points, the PINN approach had a relative percentage error of 0.69272% compared to the finite differences method, which had a percentage error of 1.28142% with respect to the analytical solution, indicating that the PINN approach was more accurate in conducting modal analysis. Our model’s continuity over the entire solution domain enhances its performance and flexibility while requiring no training data due to its guidance by Maxwell’s equations, setting it apart from most AI approaches. Our model design also flexibly enables simultaneous prediction of multiple modes over any specified intervals of effective indices. In addition, we present a novel reinforcement learning (RL)-based paradigm, employing an actor–critic model for inverse design. We utilize this paradigm to optimize the transmittance of a grating coupler by manipulating the device geometry. Comparing the obtained design to that obtained using the Particle Swarm Optimization (PSO) algorithm, our RL-based approach effectively produced a significant enhancement of 34% in 14 iterations only over the initial design compared to the PSO, which prematurely scored 27% enhancement in 30 iterations, proving that our model navigates the design space more efficiently, achieving a better design than PSO and resulting in a superior design. Based on these approaches, we discuss the future of AI in photonics in forward modeling and inverse design and the untapped potential in bringing these worlds together.

Design and Optimization of Angle-Dependent Grating Couplers for Wideband Near-Mid Infrared Transmission

Design and Optimization of Angle-Dependent Grating Couplers for Wideband Near-Mid Infrared Transmission

Impact of Grating Duty-Cycle Randomness on DFB Laser Performance

The duty-cycle randomness (DCR) of the Bragg grating of the distributed feedback (DFB) lasers introduced by the fabrication process is inevitable, even with state-of-the-art technologies such as electron beam lithography and dry or wet etching.This work investigates the impact of grating DCR on DFB laser performance through numerical simulations. The result reveals that such randomness causes a reduction in the side mode suppression ratio (SMSR), and deteriorates the noise characteristics, i.e., broadens the linewidth and increases the relative intensity noise (RIN). With the grating DCR, the effective grating coupling coefficient decreases as evidenced by the reduced Bragg stopband width. However, the longitudinal spatial hole burning (LSHB) effect in the DFB lasers can somewhat be diminished by the grating DCR. The seriousness of these effects depends on different grating structures and their coupling strengths. Our simulation shows that a degradation of 17 dB can be brought to the SMSR of the uniform grating DFB lasers with their duty cycles taking a deviation of ±25% in a uniformly distributed random fashion. It also broadens the linewidth of the quarter-wavelength phase-shifted DFB lasers by more than 2.5 folds. The impact of this effect on the RIN is moderate—less than 2%. All the performance deteriorations can partially be attributed to the effective reduction in the grating coupling coefficient of around 20% by such a DCR.

Electrically Injected Metamaterial Grating DFB Laser Exploiting an Ultra‐High Q Electromagnetic Induced Transparency Resonance for Spectral Selection

AbstractThe study shows that, in waveguide (WG) configuration, the coupling of a 2D plasmonic metamaterial grating (MMG) having a conventional Bragg period along the guide but a distinct period along the transverse axis can lead to Electromagnetically‐Induced‐Transparency (EIT) behavior. This epitomizes that metamaterials, as functional photonic building blocks, can lead to low losses in many standard devices if properly designed. The study reported the observation in passive WGs of a marked Fano‐type EIT resonance with record high‐quality factor: Q = 5000 and contrast &gt;20 dB. Unlike any standard metal grating, MMG‐assisted waveguides exhibit strong grating coupling strength and low‐loss properties simultaneously. This concept is further applied to demonstrate single‐frequency‐emission electrically‐injected Distributed Feedback (DFB) lasers in the near‐infrared telecom domain. The key point is that laser emission occurs at the peak of EIT, i.e., the maximum in transmission. It therefore addresses one of the main critical issues of DFB lasers related to the single frequency yield. The laser performances are state‐of‐the‐art (Ith &lt; 20 mA, Pmax &gt; 20 mW at I = 200 mA, SMSR &gt; 50 dB, optical feedback tolerance &gt;−21 dB compliant with IEEE 802.3 standard). The presented approach, compatible with existing industrial technologies, is promising for real‐life telecom applications.

High-efficiency self-focusing metamaterial grating coupler in silicon nitride with amorphous silicon overlay

Efficient fiber-chip coupling interfaces are critically important for integrated photonics. Since surface gratings diffract optical signals vertically out of the chip, these couplers can be placed anywhere in the circuit allowing for wafer-scale testing. While state-of-the-art grating couplers have been developed for silicon-on-insulator (SOI) waveguides, the moderate index contrast of silicon nitride (SiN) presents an outstanding challenge for implementing efficient surface grating couplers on this platform. Due to the reduced grating strength, a longer structure is required to radiate the light from the chip which produces a diffracted field that is too wide to couple into the fiber. In this work, we present a novel grating coupler architecture for silicon nitride photonic integrated circuits that utilizes an amorphous silicon (α-Si) overlay. The high refractive index of the α-Si overlay breaks the coupler’s vertical symmetry which increases the directionality. We implement subwavelength metamaterial apodization to optimize the overlap of the diffracted field with the optical fiber Gaussian mode profile. Furthermore, the phase of the diffracted beam is engineered to focalize the field into an SMF-28 optical fiber placed 55 µm above the surface of the chip. The coupler was designed using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations supported by genetic algorithm optimization. Our grating coupler has a footprint of 26.8 × 32.7 µm2 and operates in the O-band centered at 1.31 μm. It achieves a high directionality of 85% and a field overlap of 90% with a target fiber mode size of 9.2 µm at the focal plane. Our simulations predict a peak coupling efficiency of − 1.3 dB with a 1-dB bandwidth of 31 nm. The α-Si/SiN grating architecture presented in this work enables the development of compact and efficient optical interfaces for SiN integrated photonics circuits with applications including optical communications, sensing, and quantum photonics.

Novel Highly Efficient Buried Gratings for Selective Coupling of SPP Waves onto Single Interfaces

Diffraction gratings have always been used to effectively couple optical radiation within integrated waveguides. This is also valid for plasmonic structures that support Surface Plasmon Polariton (SPP) waves. Traditional gratings usually excite SPP waves at the interface where they are located or, for thin metal nanostrips, at both interfaces. But reducing the thickness of the metal layer in the presence of a grating has the handicap of increasing the tunnelling of light towards the substrate, which means higher losses and reduced coupling efficiency. In this paper, we design and optimize novel gratings buried within the metallic thin films for selective coupling of SPP waves onto individual interfaces. Compared with traditional superficial gratings, the novel buried ones demonstrate higher efficiency and much lower residual tunnelling of light through the coupling structures.

Loss analysis of a grating coupler for single-mode fiber coupling into an SOI waveguide

Silicon-on-insulator (SOI) technology is widely used in silicon photonic integrated circuits. How to improve the coupling efficiency of the light coupling in free space and optical fibers into waveguides on SOI must be discussed. Grating coupling is a commonly used and highly efficient coupling method. This article discusses the causes of loss in grating couplers from three aspects: transmission, reflection, and mode mismatch, and proposes corresponding loss reduction solutions. The coupling efficiency of Si and SiN grating couplers optimized according to the loss reduction scheme has been improved by 25% and 45%, respectively.

High-efficiency vertically emitting coupler facilitated by three wave interaction gratings.

We designed a grating coupler optimized for normal incidence and numerically demonstrate near-unity coupling in a standard 220-nm-thick silicon-on-insulator (SOI) technology. Our design breaks the vertical symmetry within the grating region by implementing three scattering sites per local period. This technique removes the need for bottom reflectors or additional material layers and can be realized using only two lithography masks. Using adjoint method-based optimization, we engineer the coupling spectrum of the grating, balancing the trade-off between peak efficiency and bandwidth. Using this technique, we simulate three devices with peak coupling efficiencies ranging between 93.4 (-0.3 dB) and 98.6% (-0.06 dB) with corresponding 1 dB bandwidths between 48 and 8 nm all centered around 1.55 µm.

High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics.

Silicon nitride (Si3N4) is an ideal candidate for the development of low-loss photonic integrated circuits. However, efficient light coupling between standard optical fibers and Si3N4 chips remains a significant challenge. For vertical grating couplers, the lower index contrast yields a weak grating strength, which translates to long diffractive structures, limiting the coupling performance. In response to the rise of hybrid photonic platforms, the adoption of multi-layer grating arrangements has emerged as a promising strategy to enhance the performance of Si3N4 couplers. In this work, we present the design of high-efficiency surface grating couplers for the Si3N4 platform with an amorphous silicon (α-Si) overlay. The surface grating, fully formed in an α-Si waveguide layer, utilizes subwavelength grating (SWG)-engineered metamaterials, enabling simple realization through single-step patterning. This not only provides an extra degree of freedom for controlling the fiber-chip coupling but also facilitates portability to existing foundry fabrication processes. Using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations, a metamaterial-engineered grating coupler is designed with a coupling efficiency of -1.7 dB at an operating wavelength of 1.31 µm, with a 1 dB bandwidth of 31 nm. Our proposed design presents a novel approach to developing high-efficiency fiber-chip interfaces for the silicon nitride integration platform for a wide range of applications, including datacom and quantum photonics.

Stochastic and multi-objective design of photonic devices with machine learning

Compact and highly performing photonic devices are characterized by non-intuitive geometries, a large number of parameters, and multiple figures of merit. Optimization and machine learning techniques have been explored to handle these complex designs, but the existing approaches often overlook stochastic quantities. As an example, random fabrication uncertainties critically determines experimental device performance. Here, we present a novel approach for the stochastic multi-objective design of photonic devices combining unsupervised dimensionality reduction and Gaussian process regression. The proposed approach allows to efficiently identify promising alternative designs and model the statistic of their response. Incorporating both deterministic and stochastic quantities into the design process enables a comprehensive analysis of the device and of the possible trade-offs between different performance metrics. As a proof-of-concept, we investigate surface gratings for fiber coupling in a silicon-on-insulator platform, considering variability in structure sizes, silicon thickness, and multi-step etch alignment. We analyze 86 alternative designs presenting comparable performance when neglecting variability, discovering on the contrary marked differences in yield and worst-case figures for both fiber coupling efficiency and back-reflections. Pareto frontiers demonstrating optimized device robustness are identified as well, offering a powerful tool for the design and optimization of photonic devices with stochastic figures of merit.

Ultralow-loss optical interconnect enabled by topological unidirectional guided resonance.

Grating couplers that interconnect photonic chips to off-chip components are crucial for various optoelectronics applications. Despite numerous efforts in past decades, the existing grating couplers are still far from optimal in energy efficiency and thus hinder photonic integration toward a larger scale. Here, we propose a strategy to achieve ultralow-loss grating couplers by using unidirectional guided resonances (UGRs), suppressing the useless downward radiation with no mirror on the bottom. By engineering the dispersion and apodizing the geometry of grating, we experimentally realize a grating coupler with a record-low loss of -0.34 dB and 1-dB bandwidth exceeding 30 nm at the telecom wavelength of 1550 nm and further demonstrate an optic via with a loss of only -0.94 dB. Given that UGRs ubiquitously exist in a variety of grating geometries, our work sheds light on a systematic method to achieve energy-efficient optical interconnect and paves the way to large-scale photonic integration.

Optimization of Grating Coupler over Single-Mode Silicon-on-Insulator Waveguide to Reach &lt; 1 dB Loss through Deep-Learning-Based Inverse Design

Grating couplers are essential components in silicon photonics that facilitate the coupling of light between waveguides and fibers. Optimization of the grating couplers to reach &lt;1 dB loss when coupling to single-mode fibers (SMFs) has been reported in the literature, but this was based on silicon-on-insulator (SOI) waveguides supporting multi-modes. In this paper, using a deep-learning model combined with an inverse-design process, we achieve &lt;1 dB losses for grating couplers implemented over single-mode SOI waveguides, i.e., a maximum efficiency of 80.5% (−0.94 dB) for gratings constrained with e-beam (EB) lithography critical dimension (CD), and a maximum efficiency of 77.9% (−1.09 dB) for gratings constrained with deep ultraviolet (DUV) lithography CD. To verify these results, we apply covariance matrix adaptation evolution strategy (CMA-ES) and find that while CMA-ES yields slightly better results, i.e., 82.7% (−0.83 dB) and 78.9% (−1.03 dB) considering e-beam and DUV, respectively, the spatial structures generated by CMA-ES are nearly identical to the spatial structures generated by the deep-learning model combined with the inverse-design process. This suggests that our approach can achieve a representative low-loss structure, and may be used to improve the performance of other types of nanophotonic devices in the future.

Surface relief coupled grating design for near-eye display

As the most important optical component in a near-eye display system, the performance of a coupling grating directly determines the imaging quality of the final display system. In order to improve the diffraction efficiency and field of view (FOV) of the coupling device, this study proposes a novel surface relief coupling grating. The structural parameters of the surface relief coupled grating are simulated and calculated by using the finite-element analysis method. The simulation results show that the diffraction efficiency of the coupling grating can reach more than 99.5%. Compared with the traditional rectangular tilted grating, the diffraction efficiency has increased by 6.4%, and the full width at half-maximum of the incident angle has increased by 4°, which proves that the structure has higher diffraction efficiency and a larger FOV. Furthermore, the surface relief coupling grating is insensitive to operating conditions and processing errors, fully meeting the processability requirements. Therefore, this new type of surface relief coupling grating can replace traditional coupling gratings and is expected to become a key coupling component in the next generation of near-eye display systems.

A High-Efficiency Wideband Grating Coupler Based on Si3N4 and a Silicon-on-Insulator Heterogeneous Integration Platform.

To fully utilize the advantages of Si3N4 and Silicon-On-Insulator to achieve a high-efficiency wideband grating coupler, we propose and numerically demonstrate a grating coupler based on Si3N4 and a Silicon-On-Insulator heterogeneous integration platform. A two-dimensional model of the coupler was established and a comprehensive finite difference time domain analysis was conducted. Focusing on coupling efficiency as a primary metric, we examined the impact of factors such as grating period, filling factor, etching depth, and the thicknesses of the SiO2 upper cladding, Si3N4, silicon waveguide, and SiO2 buried oxide layers. The calculations yielded an optimized grating coupler with a coupling efficiency of 81.8% (-0.87 dB) at 1550 nm and a 1-dB bandwidth of 540 nm. The grating can be obtained through a single etching step with a low fabrication complexity. Furthermore, the fabrication tolerances of the grating period and etching depth were studied systematically, and the results indicated a high fabrication tolerance. These findings can offer theoretical and parameter guidance for the design and optimization of high-efficiency and broad-bandwidth grating couplers.