The experimental apparatus for measurments of sputtering yield of graphite by hydrogen and helium ions was constructed. At present day the operational parformance of the system with a torsion microbalance (sensitivity: 1.5 × 10−7 g/div) has been established.Experimental result is not yet obtained.Modified torsion microbalance is under construction.We have designed the apparatus with vacuum microbalance system for measurements of sputtering yields of graphite sample. As incident ions, H+ and He+ are used, but because B-A gauge type ion source is adopted, ion beam intensity is about order of 10 100 μA/cm2. It can be considered sputtering yield of graphite by light ion with keV energy is not so large, therefore the vacuum microbalance having maximum sensitivity of 5 × 10−9 g has been designed, which is made of quartz bar (diameter of the bar is 0.5 mmϕ and the mean length is 10 cm, the balancer is about 4 g). The balance is installed in UHV chamber. The UHV system could be pumped down to pressure of 10−9 Torr, in order to keep impurity gas pressure as low as possible during sputtering. During sputtering experiment admitted sample gas is pumped with a turbo-molecular pump (70 1/sec), and after sputtering when gas filling is stopped and operation of the balance is started, the UHV system is pumped by an orbitron pump and a Ti sublimation pump to avoid gas adsorption on the sample. We have prepared two kinds of graphite samples, one is a pyloritic graphite plate 2 (5 × 5 mm2, 1 mm in thickness) and the other is a graphite thin film (500 A) sample deposited on gold coated mica plate. These sample plates could be outgassed by electron bombardment.For the graphite film low energy He+ ion scattering technique (ISS) can be applied as well as vacuum microbalance technique. As the thin film is gradually sputtereched by impact ions, the scattering signal intensity ratio I(c)/I(Au) will show a change, i.e. shadowing of gold atom by carbon atom could be measured by as a function of film thickness.
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