Designing and preparing lightweight electromagnetic shielding materials at the micron level is crucial for aerospace and military applications. Vertical graphene nanowalls (VGNs) offer high efficiency for electromagnetic shielding due to attributes such as high carrier mobility, porosity, and low density. This study presents the preparation of ultra-thin VGNs/metal stacked films via plasma-enhanced chemical vapor deposition (PECVD) for VGNs, and combined electron beam evaporation (EBE) with cyclic PECVD for metal layers. The PECVD technique ensures homogeneity and controllable thickness of the VGNs. The experimental results demonstrate that the interface between the VGNs and the metal layer exhibits good interfacial contact, resulting in high carrier mobility. Furthermore, incorporating a metal layer with a thickness ratio of 10 % significantly enhances conductivity by an order of magnitude. The hybrid structures exhibit remarkable electromagnetic shielding effectiveness per unit thickness (∼5300 dB mm−1) evaluated in the X-band range (8–12 GHz). Stacked films as thin as 0.01 mm achieve up to 53.4 dB of electromagnetic shielding. Finite element simulations indicate that the presence of opposing electric fields at the graphene-metal interface contributes to higher ohmic loss. The coupling effect at the interface significantly contributes to the material's excellent electromagnetic shielding effectiveness.